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Plasma-Induced Stabilization of Pmma Surfaces for Enhanced Adhesion of Plasma-Deposited Coatings

Published online by Cambridge University Press:  10 February 2011

J. E. Klemberg-Sapieha
Affiliation:
Department of Engineering Physics and Materials Engineering, Ecole Polytechnique, Montreal, Qc, Canada, H3C 3A7, [email protected]
L. Martinu
Affiliation:
Department of Engineering Physics and Materials Engineering, Ecole Polytechnique, Montreal, Qc, Canada, H3C 3A7, [email protected]
N. L. S. Yamasaki
Affiliation:
Optical Coating Laboratory Inc., Santa Rosa, CA presently with Younger Optics, Torrance, CA
C. W. Lantman
Affiliation:
Flex Products Inc., Santa Rosa, CA
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Abstract

Adhesion of plasma-deposited optical and protective coatings, such as amorphous hydrogenated silicon nitride, SiN1.3, on polymethyl-methacrylate (PMMA) substrates has been found to be limited by a cohesive failure inside the PMMA bulk. Using direct exposure to a low pressure plasma in helium or to vacuum ultraviolet radiation generated from H2 plasma for an extended period of time, we succeeded to obtain excellent adhesion even under a humidity test at elevated temperature. We found, using a multitechnique approach, that such improved adhesion is achieved by forming a crosslinked, mechanically stabilized layer in the interfacial region, which possesses a physical thickness of 50 to 100 nm.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

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