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Physical Properties of Ternary Re-Fe Base Alloys and their Relationship to Permanent Magnet Applications

Published online by Cambridge University Press:  25 February 2011

K. H. J. Buschow
K. H. J. Buschow*
Affiliation:
Philips Research Laboratories P.O.Box 80000, 5600 JA Eindhoven, The Netherlands
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Abstract

Several ternary compounds of tetragonal structure and with the composition R2Fe14B have found an application as starting materials for permanent magnets. Several physical properties of R2Fe14B compounds will be discussed in relation to the modification in properties that can be obtained by substituting other elements for R, Fe or B. Also investigated is the extent to which it will be possible to find alternative materials differing in structure and composition from R2Fe14B. For this purpose the results obtained on 3d-rich ternaries based on well-known structure types will be reviewed. Included in this survey will be novel ternary intermetallics made by crystallization from the amorphous state. These compounds, though stable enough for applications, are actually metastable. They are not found in the corresponding equilibrium diagrams.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 96: Symposium F – High Performance Permanent Magnet Materials , 1987 , 1
Copyright
Copyright © Materials Research Society 1987

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References

REFERENCES

[1] Sagawa, M., Fujimura, S., Togawa, M., Yamamoto, H. and Matsura, Y., J. Appl. Phys. 55, 2083 (1984).Google Scholar
[2] Lee, R.W., Brewer, E.G. and Schafel, N.A., Proc. Intermag. Conf. St. Paul Minnesota, April 1985.Google Scholar
[3] Buschow, K.H.J., Mat. Sci. Repts. 1, (1986) 3.Google Scholar
[4] Van Noort, H.M. and Buschow, K.H.J., J. Less-Common Met. 113, (1986) L9.Google Scholar
[5] Herbst, J.F. and Yellon, W.B., J. Appl. Phys. 60, (1986) 4224.Google Scholar
[6] Huang, M.Q., Boltich, E.B., Wallace, W.E. and Oswald, E., J. Magn. Magn. Mater. 60, (1986) 270.Google Scholar
[7] Pedziwiatr, A.T., Jiang, S.Y. and Wallace, W.E., J. Magn. Magn. Mater. 62, (1980) 29.Google Scholar
[8] Bolzoni, F., Coey, J.M.D., Gavigan, J., Givord, D., Moze, O., Pareti, L. and Viadieu, T., J. Magn. Magn. Mater. 65, (1987) 123.Google Scholar
[9] Grössinger, R., Krewenka, R., Kirchmayr, H.R., Sinnema, S., Yang-Fu-Ming, Ying-kai, Huang, Boer, F.R. de de and Buschow, K.H.J., J. Less-Common Met. 132 (1987).Google Scholar
[10] Gu, Zong-Quan and Ching, W.Y., J. Appl. Phys. (at the press).Google Scholar
[11] Smit, H.H.A., Thiel, R.C. and Buschow, K.H.J., Physica (1987).Google Scholar
[12] Boge, M., Czjzek, G., Givord, D., Jeandey, C., Li, H.S. and Oddou, J.L., J. Phys. F. 16, (1986) L67.Google Scholar
[13] Abache, C. and Oesterreicher, H., J. Appl. Phys. 60, (1986) 1114.Google Scholar
[14] Hirosawa, S., Tokuhara, K., Yamamoto, H., Fujimura, S., Sagawa, M. and Yamamuchi, H., J. Appl. Phys. 59, (1986) 873.Google Scholar
[15] Grössinger, R., Krewenka, R., Sun, X.K., Eibler, R., Kirchmayr, H.R. and Buschow, K.H.J., J. Less-Comm. Met. 124, (1986) 165.Google Scholar
[16] Yelon, W.B., Foley, B., Abache, C. and Oesterreicher, H., J. Appl. Phys. 60, (1986) 2982.Google Scholar
[17] Pareti, L., Bolzoni, F., Solzi, M. and Buschow, K.H.J., J. Less-Comm. Met. 132 (1987) L5.Google Scholar
[18] Grössinger, R., Krewenka, R., Kirchmayr, H.R., Naastepad, P. and Buschow, K.H.J. J. Less-Common Met. (to be published).Google Scholar
[19] Durst, K.D. and Kronmüller, H., J. Magn. Magn. Mat. (at the press).Google Scholar
[20] Liu, N.C., Stadelmaier, H.H. and Schneider, G., (to be published).Google Scholar
[21] Liu, N.C. and Stadelmaier, H.H., Mat. Lett. (at the press).Google Scholar
[22] Bolzoni, P., Leccabue, F., Pareti, L. and Sanchez, J.L., J. Phys. (Paris) 46, (1985) C6–305.Google Scholar
[23] Gubbens, P.C.M., van der Kraan, A.M., van Loef, J.J. and Buschow, K.H.J., J. Magn. Magn. Mat. (at the press).Google Scholar
[24] Chevalier, B., Gurov, G., Fournes, L. and Etourneau, J., J. Chem. Res. (to be published).Google Scholar
[25] de Boer, F.R., Ying-kai, Huang, de Mooij, D.B. and Buschow, K.H.J., J. Less Comm. Met. (to be published).Google Scholar
[26] de Mooij, D.B., Daams, J.L.C. and Buschow, K.H.J., Philips J. Research (at the press).Google Scholar
[27] Buschow, K.H.J., de Mooij, D.B. and van Noort, H.M., J. Less-Common Met. 125, (1986) 135.Google Scholar