Hostname: page-component-78c5997874-lj6df Total loading time: 0 Render date: 2024-11-19T03:47:24.847Z Has data issue: false hasContentIssue false
  • English
  • Français

Photonic Crystals Based onMacroporous Silicon

Published online by Cambridge University Press:  10 February 2011

V. Lehmann ,
U. Grüning  and
A. Birner
V. Lehmann
Affiliation:
Siemens AG, Dept. ZT ME 1, 81730 München, Germany
U. Grüning
Affiliation:
Siemens AG, Dept. ZT ME 1, 81730 München, Germany
A. Birner
Affiliation:
MPI für Mikrostrukturphysik, Am Weinberg 2, 01620 Halle, Germany
Get access

Abstract

The formation of macropore arrays with high aspect ratios by electrochemical etching of n-type silicon in hydrofluoric acid is a well established technique. By using standard photolithograpy the geometry of the array can be controlled with high precision. This enables us to fabricate twodimensional photonic crystals for the infrared regime. The calculated photonic band structure of the crystal corresponds well with the transmission observed experimentally. Furthermore first defect structures like waveguides and cavities have been realized.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 533: Symposium FF – Epitaxy & Applications of Si-Based Heterostructures , 1998 , 151
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Yablonovitch, E., Phys. Rev. Lett., 58, 2059, (1987).Google Scholar
[2] Yablonovitch, E., Gmitter, T., and Leong, K. M., Phys. Rev. Lett., 67, 2017, (1991).Google Scholar
[3] Lehmann, V. and Föll, H., J. Electrochem. Soc., 137, 653, (1990).Google Scholar
[4] Lehmann, V.,Hönlein, W., Reisinger, H., Spitzer, A., Wendt, H., and Wilier, J., Solid State Technol. 38, 99, (1995).Google Scholar
[5] Grüning, U., Lehmann, V., Ottow, S., and Busch, K., Appl. Phys. Lett. 68,747, (1996).Google Scholar
[6] Lehmann, V., J. Electrochem. Soc.,140, 2836, (1993).Google Scholar
[7] Lehmann, V., Thin Solid Films, 140, 2836, (1993).Google Scholar
[8] Ottow, S.and Lehmann, V., J. Electrochem. Soc., 140, 2836, (1993).Google Scholar
[9] Gruining, U., Lehmann, V., and Engelhardt, C. M., Appl. Phys. Lett., 66, 3254, (1995).Google Scholar
[10] Foresi, J. S., Villeneuve, P. R., Ferrera, J., Thoen, E. R., Steinmeyer, G., Fan, S., Joannopoulos, J. D., Kimerling, L. C., Smith, H. I., and Ippen, E. P., Nature, 390, 144, (1997).Google Scholar