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Photoacoustic spectra from copper phthalocyanine films on Si wafers

Published online by Cambridge University Press:  21 March 2011

Masato Ohmukai ,
Hitoshi Kubota  and
Yasuo Tsutsumi
Masato Ohmukai
Affiliation:
Department of Electrical Engineering, Akashi College of Technology, Hyogo 674-8501, Japan
Hitoshi Kubota
Affiliation:
Department of Electrical Engineering, Akashi College of Technology, Hyogo 674-8501, Japan
Yasuo Tsutsumi
Affiliation:
Department of Electrical Engineering, Akashi College of Technology, Hyogo 674-8501, Japan
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Abstract

Copper phthalocyanine (CuPc) films were deposited on (100) silicon wafers by means of a vacuum evaporation method. We examined the films using photoacoustic (PA) spectroscopy to study their optical absorption properties. It was clarified that the PA signal from the silicon substrate can be excluded with a chopping frequency of 200 Hz when the film thickness is greater than 4.4 m. We detected an absorption band at 1.128 eV.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 672: Symposium O – Mechanisms of Surface and Microstructure Evolution in Deposited Films and Film Structures , 2001 , O3.3
Copyright
Copyright © Materials Research Society 2001

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References

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