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Phase-Field Simulation of Domain Structure Evolution in Ferroelectric Thin Films

Published online by Cambridge University Press:  21 March 2011

Y. L. Li ,
S. Y. Hu ,
Z. K. Liu  and
L. Q. Chen
Y. L. Li
Affiliation:
Department of Materials Science and EngineeringThe Pennsylvania State UniversityUniversity Park, PA 16802, USA
S. Y. Hu
Affiliation:
Department of Materials Science and EngineeringThe Pennsylvania State UniversityUniversity Park, PA 16802, USA
Z. K. Liu
Affiliation:
Department of Materials Science and EngineeringThe Pennsylvania State UniversityUniversity Park, PA 16802, USA
L. Q. Chen
Affiliation:
Department of Materials Science and EngineeringThe Pennsylvania State UniversityUniversity Park, PA 16802, USA
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Abstract

A phase-field model for predicting the domain structure evolution in constrained ferroelectric thin films is developed. It employs an analytical elastic solution derived for a constrained film with arbitrary eigenstrain distributions. In particular, the model is applied to the domain structure evolution during a cubic→tetragonal proper ferro- electric phase transition. The effect of substrate constraint on the volume fractions of domain variants, domain-wall orientations, and domain shapes is studied. It is shown that the predicted results agree very well with existing experimental observations in ferroelectric thin films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 652: Symposium Y – Influences of Interface & Dislocation Behavior on Microstructure Evolution , 2000 , Y4.2
Copyright
Copyright © Materials Research Society 2001

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References

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