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Oxide Formation on NbAl3, and TiAl Due to Ion Implantation of 18O
Published online by Cambridge University Press: 22 February 2011
Abstract
Surface modification by ion implantation of 18O ions was investigated as a technique for altering the high-temperature oxidation of aluminide intermetallic compounds and related alloys. Specimens of NbAl3 and TiAl were implanted to a dose of 1×1018 ions/cm2 at 168 keV. Doses and accelerating energies were calculated to obtain near-stoichiometric concentrations of oxygen. Use of 18O allowed the implanted oxygen profiles to be measured using secondary ion mass spectroscopy (SIMS). The near surface oxides formed were studied using x-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy. Specimens were also examined using x-ray diffraction and SEM. This paper presents results for specimens examined in the as-implanted state. The oxide formed due to implantation is a layer containing a mixture of Nb or Ti and amorphous Al oxides.
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- Copyright © Materials Research Society 1994