Hostname: page-component-cd9895bd7-mkpzs Total loading time: 0 Render date: 2024-12-27T01:47:47.196Z Has data issue: false hasContentIssue false
  • English
  • Français

Oxide Formation During Flight of Ablated Fragments

Published online by Cambridge University Press:  01 January 1992

Osamu Eryu ,
Kenji Yamaoka  and
Kohzoh Masuda
Osamu Eryu
Affiliation:
Institute of Materials Science, University of Tsukuba Tsukuba Academic City, lbaraki 305, Japan
Kenji Yamaoka
Affiliation:
Institute of Materials Science, University of Tsukuba Tsukuba Academic City, lbaraki 305, Japan
Kohzoh Masuda
Affiliation:
Institute of Materials Science, University of Tsukuba Tsukuba Academic City, lbaraki 305, Japan
Get access

Abstract

Collision processes between oxygen molecules and laser ablated fragments from YBa2Cu3Oy superconductor target are described. The space/time resolved photo-emission measurements of Cu and CuO were carried out in order to investigate the oxidation of the laser ablated fragments in O2 atmosphere. Increase of the photo-emission yield of CuO was observed over 100 mTorr and it showed maximum at 2 Torr. Velocity of CuO decreases abruptly at 200 mTorr. The velocity distribution spreads above 500 mTorr. An optimum range of oxygen pressure to fabricate superconducting thin films of Tc = 90 K was from 250 mTorr to 500 mTorr. Process of the reactive collisions of ablated fragments with O2 molecules in this range is discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 285: Symposium I – Laser Ablation in Materials Processing–Fundamentals and Applications , 1992 , 57
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Wu, X.D., Dutta, B., Hegde, M.S., Inam, A., Venkatesan, T., Chase, E.W., Chang, C.C., and Howard, R., Appl. Phys. Lett. 54, 179 (1989).Google Scholar
2. Girault, C., Daminai, D., Aubreton, J., and Catherinot, A., Appl. Phys. Lett. 54, 2035 (1989).Google Scholar
3. Hiramatsu, M. and Ishibashi, S., The Review of Laser Engineering, 18, 355 (1990).Google Scholar
4. Scott, K., Huntley, J.M., Phillips, W.A., Clarke, J., and Field, J.E., Appl. Phys. Lett. 2, 922 (1990).Google Scholar
5. Eryu, O., Murakami, K., Masuda, K., Shihoyama, K., and Mochizuki, T., Jpn. J. Appl. Phys. 31, L86 (1992).Google Scholar
6. Eryu, O., Murakami, K., Masuda, K., Kasuya, A., and Nishina, Y., Appl. Phys. Lett. 54, 2716 (1989).Google Scholar
7. Dyer, P.E., Greenough, R.D., Issa, A., and Key, P.H., Appl. Phys. Lett. 53, 534 (1988).Google Scholar
8. Zheng, J.P., Huang, Z.Q., Shaw, D.T., and Kwok, H.S., Appl. Phys. Lett. 54, 280 (1989).Google Scholar
9. Zhen, J.P., Ying, Q.Y., Witanachchi, S., Huang, Z.Q., Shaw, D.T., and Kwok, H.S., Appl. Phys. Lett. 54, 954 (1989).Google Scholar
10. Kelly, R. and Dreyfus, R.W., Nucl. Instrum. Methods, B32, 341 (1988).Google Scholar
11. Geohegan, D.B. and Mashburn, D.N., Appl. Phys. Lett. 55, 2345 (1989).Google Scholar
12. Chiba, H., Murakami, K., Eryu, O., Shihoyama, K., Mochizuki, T., and Masuda, K., Jpn. J. Appl. Phys. 30, 1732 (1991).Google Scholar