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Published online by Cambridge University Press: 25 February 2011
Boron nitride and titanium-boron multilayers (some of which were implanted with nitrogen- or argon ions) have been deposited on pure titanium substrates with an RF sputtering technique. The high temperature (850 °C) behavior of these samples in an oxidizing atmosphere has been studied. While the boron nitride coatings decompose rapidly, with boron diffusing to the surface, an important role for nitrogen has been evidenced. The concentration of nitrogen found at the interface, forming a diffusion barrier, can account for a certain degree of protection.