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Optimized Materials Properties for Organosilicate Glasses Produced by Plasma-Enhanced Chemical Vapor Deposition

Published online by Cambridge University Press:  01 February 2011

M.L. O'Neill ,
R.N. Vrtis ,
J.L. Vincent ,
A.S. Lukas ,
E.J. Karwacki ,
B.K. Peterson  and
M.D. Bitner
M.L. O'Neill
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195
R.N. Vrtis
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195
J.L. Vincent
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195
A.S. Lukas
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195
E.J. Karwacki
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195
B.K. Peterson
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195
M.D. Bitner
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195
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Abstract

In this paper we examine the relationship between precursor structure and material properties for films produced from several leading organosilicon precursors on a common processing platform. Results from our study indicate that for the precursors tested the nature of the precursor has little effect upon film composition but significant impact on film structure and properties.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 766: Symposium E – Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics - 2003 , 2003 , E8.17
Copyright
Copyright © Materials Research Society 2003

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References

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