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The Optimization of Niobium Diselenide Thin Films Through Control of Pulsed Laser Deposition Parameters

Published online by Cambridge University Press:  01 January 1992

Allan E. Day ,
Samuel J.P. Laube ,
M.S. Donley  and
J.S. Zabinski
Allan E. Day
Affiliation:
WIJMLB, Materials Directorate, OH
Samuel J.P. Laube
Affiliation:
University of Cincinnati, OH
M.S. Donley
Affiliation:
WIJMLB, Materials Directorate, OH
J.S. Zabinski
Affiliation:
WIJMLB, Materials Directorate, OH
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Abstract

Niobium diselenide has potential for use as a conductive lubricant, but to achieve the optimal properties of low friction coefficient, high conductivity and oxidation resistance, the SeJNb ratio and crystallinity must be carefully controlled. It has been shown that Pulsed Laser Deposition (PLD) permits the required degree of control, even over films with complex stoichiometries. (4–8). In this study, PLD was used to grow stoichiometric, crystalline thin films of niobium diselenide and to study the effects of laser deposition parameters on film properties. Film chemistry and crystallinity were evaluated using XPS, RBS, and glancingangle XRD. Friction and wear measurements were taken on a ball-on-flat tribometer. The deposition apparatus incorporates a fully computerized data acquisition and control system that facilitated the correlation of the laser deposition parameters to film properties. This study has shown that film chemistry could be changed from substoichiometric to superstoichiometric and crystallinity varied between amorphous to highly crystalline by appropriate choice of PLD parameters. The property correlations and acquisition system that permitted the identification of the optimal growth conditions will be described.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 285: Symposium I – Laser Ablation in Materials Processing–Fundamentals and Applications , 1992 , 539
Copyright
Copyright © Materials Research Society 1993

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References

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