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Optical Thin Films with Very Low Refractive Index and Their Application in Photonics Devices

Published online by Cambridge University Press:  26 February 2011

Jingqun Xi ,
Jong Kyu Kim ,
Dexian Ye ,
Jasbir S. Juneja ,
T.-M. Lu ,
Shawn-Yu Lin  and
E. F. Schubert
Jingqun Xi
Affiliation:
[email protected], Rensselaer Polytech Institute, Physics, Applied Physics, & Astronomy, CII 8231, Future Chips Constellation,, 110 8th Street, RPI,, Troy, NY, 12180, United States
Jong Kyu Kim
Affiliation:
[email protected], Rensselaer Polytechnic Institute, Department of Electrical, Computer, & Systems Engineering
Dexian Ye
Affiliation:
[email protected], Rensselaer Polytechnic Institute, Department of Physics, Applied Physics, & Astronomy
Jasbir S. Juneja
Affiliation:
[email protected], Rensselaer Polytechnic Institute, Department of Chemical & Biological Engineering
T.-M. Lu
Affiliation:
[email protected], Rensselaer Polytechnic Institute, Department of Physics, Applied Physics, & Astronomy
Shawn-Yu Lin
Affiliation:
[email protected], Rensselaer Polytechnic Institute, Department of Physics, Applied Physics, & Astronomy
E. F. Schubert
Affiliation:
[email protected], Rensselaer Polytechnic Institute, Department of Electrical, Computer, & Systems Engineering
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Abstract

The refractive index contrast in dielectric multilayer structures, optical resonators and photonic crystals is an important figure of merit, which creates a strong demand for high quality thin films with a very low refractive index. SiO2 nano-rod layers with low refractive indices n = 1.08, the lowest ever reported in thin-film materials, is grown by oblique-angle e-beam deposition of SiO2 with vapor incident angle 85 degree. Scanning electron micrographs reveal a highly porous columnar structure of the low-refractive-index (low-n) film. The gap between the SiO2 nano-rods is ≤50 nm, i.e. much smaller than the wavelength of visible light, and thus sufficiently small to make scattering very small. Optical micrographs of the low-n film deposited on a Si substrate reveal a uniform specular film with no apparent scattering. The unprecedented low index of the SiO2 nano-rod layer is confirmed by both ellipsometry measurements and thin film interference measurements. A single-pair distributed Bragg reflector (DBR) employing the SiO2 nano-rod layer is demonstrated to have enhanced reflectivity, showing the great potential of low-n films for applications in photonic structures and devices.

Keywords

optical propertiesnanoscalescanning electron microscopy (SEM)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 901: Symposium R – Assembly at the Nanoscale – Toward Functional Nanostructured Materials , 2005 , 0901-Ra11-29-Rb11-29
Copyright
Copyright © Materials Research Society 2006

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