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Optical Reflectometry for Detailed Modeling of Buried Layers in Silicon-on-Insulator
Published online by Cambridge University Press: 25 February 2011
Abstract
Optical reflectometry has been used to describe the morphology of buried layers by high dose oxygen ion implantation into silicon. Previous work has demonstrated that the layer depth, thickness, and shape of surrounding regions with a graded concentration of oxygen can be successfully modeled when compared to SIMS and XTEM. A selection of nomographs for analyzing spectra resulting from conventional implant conditions as a function of dose and screen oxide thickness are presented.
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- Copyright © Materials Research Society 1987