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Optical Considerations for Excimer Projection Systems

Published online by Cambridge University Press:  26 February 2011

M. Rothschild  and
D. J. Ehrlich
M. Rothschild
Affiliation:
Lincoln Laboratory, Massachusetts Institute of Technology Lexington, MA 02173
D. J. Ehrlich
Affiliation:
Lincoln Laboratory, Massachusetts Institute of Technology Lexington, MA 02173
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Abstract

Excimer laser projection systems are expected to become widely used photolithographic tools, capable of high throughputs at resolution well below 0.5 iffli. The design of practical devices must overcome several challenges which are specific to the short wavelength, the laser performance and the photoresist response of such systems. This paper addresses the issues of UV optical materials, the effects of laser bandwidth on optical design, and the interrelationship between resist response, resolution, and laser pulse-to-pulse stability. It is shown how the various parameters are interconnected, and directions for further technological improvements are outlined.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 101: Symposium B – Laser and Particle-Beam Chemical Processing for Microelectronics , 1987 , 13
Copyright
Copyright © Materials Research Society 1998

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References

REFERENCES

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