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Optical Characteristics of Planar Waveguides in Simox Structures

Published online by Cambridge University Press:  15 February 2011

G T Reed ,
A G Rickman ,
B L Weiss ,
F Namavar ,
E Cortesi  and
R A Soref
G T Reed
Affiliation:
Department of Electronic and Electrical Engineering (joint appointment with the Department of Physics)University of Surrey Guildford, Surrey GU2 5XH, UK
A G Rickman
Affiliation:
Department of Electronic and Electrical Engineering (joint appointment with the Department of Physics)University of Surrey Guildford, Surrey GU2 5XH, UK
B L Weiss
Affiliation:
Department of Electronic and Electrical Engineering (joint appointment with the Department of Physics)University of Surrey Guildford, Surrey GU2 5XH, UK
F Namavar
Affiliation:
Department of Electronic and Electrical Engineering (joint appointment with the Department of Physics)University of Surrey Guildford, Surrey GU2 5XH, UK
E Cortesi
Affiliation:
Spire Corporation Patriots Park Bedford, MA 01730
R A Soref
Affiliation:
Rome Laboratory Hanscom Air Force Base MA 01731
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Abstract

Results are presented for the propagation loss of planar optical waveguides fabricated in SIMOX structures with Si overlayers whose thickness varies from 0.57 μm to 6.0 μm. The results demonstrate that thick Si overlayers are required to produce propagation losses below 1 dB/cm. In addition, the results of the coupling between two vertically integrated waveguides formed using two buried SiO2 layers are also reported.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 244: Symposium J – Optical Waveguide Materials , 1991 , 387
Copyright
Copyright © Materials Research Society 1992

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References

REFERENCES

1. Soref, R A and Lorenzo, J P, “Light by light modulation in silicon on insulator waveguides”, Integrated and Guided Wave Optics, 1989 Tech Dig Series, Opt Soc Amer, Washington DC, February 6th, pp 86–89, 1989.Google Scholar
2. Weiss, B L and Reed, G T, ‘The modal properties of optical waveguides in SIMOX structures”, Optical and Quantum Electronics 23 pp 1061–1065, 1991.10.1007/BF00611443CrossRefGoogle Scholar
3. Weiss, B L, Reed, G T, Toh, S K, Soref, R A and Namavar, F, “Optical waveguides in SIMOX structures”, IEEE Photonics Technol Lett 3, pp 19–21, 1991.10.1109/68.68035Google Scholar
4. Schmidtchen, J and Peterman, K, “Low loss single mode optical waveguides with a large cross section in silicon-on-insulator” Electron Lett 27 pp 1486–1487, 1991.10.1049/el:19910930Google Scholar
5. Canham, L T, “Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers”, Appl Phys Lett 57, pp 1046–1048, 1990.10.1063/1.103561Google Scholar
6. Hemment, P L F and Reeson, K J, “Hidden depths to devices”, Phys World 2 pp 39–42, 1989.10.1088/2058-7058/2/6/26Google Scholar
7. Kurdi, B N and Hall, D G, “Optical waveguides in implanted buried-oxide silicon-on-insulator structures”, Opt Lett 13 pp 175–177, 1988.10.1364/OL.13.000175CrossRefGoogle Scholar
8. Soref, R A, Schmidtchen, J and Peterman, K, “Large single mode rib waveguides in Ge/Si and Si-on-SiO2”, IEEE Quantum Electron 27pp 1971–1974, 1991.10.1109/3.83406CrossRefGoogle Scholar
9. Hill, D, Fraudorf, P and Fraudorf, G, “The reduction of dislocations in oxygen implanted silicon-on-insulator layers by sequential implantation and annealing”, J Appl Phys 63 pp 4933–4936, 1988.10.1063/1.340436CrossRefGoogle Scholar
10. Namavar, F, Cortesi, E and Sioshansi, P, “Low defect high quality SIMOX produced by multiple oxygen implantation with substoichiometric total dose”, Proc Mat Res Soc 128, pp 623–628, 1989.10.1557/PROC-128-623Google Scholar
11. Namavar, F, Cortesi, E, Soref, R A and Sioshansi, P, “On the formation of thick multiple layer SIMOX structures and their applications”, Proc Mat Res Soc 147, pp 241–248, 1989.10.1557/PROC-147-241Google Scholar
12. Soref, R A, Cortesi, E, Namavar, F and Friedman, L, “Vertically integrated silicon-on-insulator waveguides”, IEEE Photon Technol Lett 3, pp 22–24, 1991.10.1109/68.68036CrossRefGoogle Scholar