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Optical and Structural Properties of CaF2:Nd Films on Si-Based Substrates
Published online by Cambridge University Press: 21 February 2011
Abstract
By thermally evaporating CaF2 and NdF3, we have grown Nd-doped CaF2 films on Si(111), A1/Si(111) and quarter-wavelength Ta2O5/SiO2 multilayer Bragg reflectors. The optical and structural properties of the CaF2:Nd films are characterized by photoluminescence spectroscopy (PL) and x-ray diffraction. The effects of different Nd concentration, growth temperatures and post-annealing were studied. Regardless of the substrates, the as-grown films show emission lines at wavelengths similar to bulk CaF2:Nd. Annealing the films at 700°C in forming gas results in a new emission pattern. Little difference between the PL spectra of polycrystalline and single crystal CaF2:Nd films is observed, indicating that the luminescence efficiency is insensitive to the crystalline quality of the films.
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- Copyright © Materials Research Society 1993
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