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Optical and electrical properties of tin oxide-based thin films prepared by streaming process for electrodeless electrochemical deposition

Published online by Cambridge University Press:  09 June 2015

Farnood Khalilzadeh-Rezaie ,
Isaiah O. Oladeji ,
Gbadebo. T. Yusuf ,
Janardan Nath ,
Nima Nader ,
Shiva Vangala ,
Justin W. Cleary ,
Winston V. Schoenfeld  and
Robert E. Peale
Farnood Khalilzadeh-Rezaie
Affiliation:
Department of Physics, University of Central Florida, Orlando, FL 32816, U.S.A.
Isaiah O. Oladeji
Affiliation:
SISOM Thin Films LLC,Orlando, FL 32805, U.S.A.
Gbadebo. T. Yusuf
Affiliation:
Department of Basic Sciences, Osun State Polytechnic, Iree, Nigeria
Janardan Nath
Affiliation:
Department of Physics, University of Central Florida, Orlando, FL 32816, U.S.A.
Nima Nader
Affiliation:
Air Force Research Laboratory, Sensors Directorate, Wright-Patterson Air Force Base, OH 45433, U.S.A. Solid State Scientific Corporation, Hollis, NH 03060, U.S.A.
Shiva Vangala
Affiliation:
Air Force Research Laboratory, Sensors Directorate, Wright-Patterson Air Force Base, OH 45433, U.S.A. Solid State Scientific Corporation, Hollis, NH 03060, U.S.A.
Justin W. Cleary
Affiliation:
Air Force Research Laboratory, Sensors Directorate, Wright-Patterson Air Force Base, OH 45433, U.S.A.
Winston V. Schoenfeld
Affiliation:
College of Optics and Photonics, University of Central Florida, Orlando, FL 32816, U.S.A.
Robert E. Peale
Affiliation:
Department of Physics, University of Central Florida, Orlando, FL 32816, U.S.A.
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Abstract

Transparent conducting thin-films of SnO2: F were grown on preheated glass, Al2O3 coated glass, and quartz substrates by Streaming Process for Electrodeless Electrochemical Deposition (SPEED). Stannic chloride (SnCl4) and ammonium fluoride (NH4F) dissolved in a mixture of deionized water and organic solvents were used as precursors. The preheated substrate temperature was varied between 440 and 500 °C. High quality SnO2:F films were grown at all the substrate temperatures studied. The resulting typical film thickness was 250 nm. X-ray diffraction shows that the grown films are polycrystalline SnO2 with a tetragonal crystal structure. The average optical transmission of the films was around 93% throughout the wavelength range 400 to 1000 nm. The lowest electrical resistivity achieved was 6 × 10-4 Ω-cm. The Hall measurements showed that the film is an n-type semiconductor, with carrier mobility of 8.3 cm2/V-s, and carrier concentration of 1 × 1021 cm-3. The direct bandgap was determined to be 4.0 eV from the transmittance spectrum.

Keywords

transparent conductorSnoptical properties
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1805: Symposium SS/TT – Fabrication and Properties of Oxide Thin Films, Nanostructures and Interfaces for Advanced Applications , 2015 , mrss15-2136423
Copyright
Copyright © Materials Research Society 2015 

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References

REFERENCES

Ginley, D.S., Bright, C., Transparent Conducting Oxides, MRS Bulletin, 25 (2000) 15–18.CrossRefGoogle Scholar
Coutts, T.J., Mason, T.O., Perkins, J., Ginley, D.S., Transparent conducting oxides: status and opportunities in basic research, Proc. Electrochem. Soc, 99 (1999) 274–288.Google Scholar
Stadler, A., Transparent conducting oxides—An up-to-date overview, Materials, 5 (2012) 661–683.CrossRefGoogle ScholarPubMed
Liu, H., Avrutin, V., Izyumskaya, N., Özgür, Ü., Morkoç, H., Transparent conducting oxides for electrode applications in light emitting and absorbing devices, Superlattices and Microstructures, 48 (2010) 458–484.CrossRefGoogle Scholar
Wang, Y., Wu, X., Li, Y., Zhou, Z., Mesostructured SnO2 as sensing material for gas sensors, Solid-State Electronics, 48 (2004) 627–632.CrossRefGoogle Scholar
Rakhshani, A., Makdisi, Y., Ramazaniyan, H., Electronic and optical properties of fluorine-doped tin oxide films, Journal of Applied Physics, 83 (1998) 1049–1057.CrossRefGoogle Scholar
Elangovan, E., Ramamurthi, K., Studies on micro-structural and electrical properties of spray-deposited fluorine-doped tin oxide thin films from low-cost precursor, Thin solid films, 476 (2005) 231–236.CrossRefGoogle Scholar
Oladeji, I.O., Film growth system and method, US Patent 7,793,611 (2010).Google Scholar
Oladeji, I.O., Chow, L., Optimization of chemical bath deposited cadmium sulfide thin films, Journal of the Electrochemical Society, 144 (1997) 2342–2346.CrossRefGoogle Scholar
Oladeji, I.O., Method for fabricating copper-containing ternary and quaternary chalcogenide thin films, in, US Patent 7,972,899 (2011).Google Scholar
Rezaie, F.K., Panjwani, D., Nath, J., Fredricksen, C.J., Oladeji, I.O., Peale, R.E., Junctionless thin-film ferroelectric oxides for photovoltaic energy production, in: SPIE Sensing Technology+ Applications, International Society for Optics and Photonics, 2014, pp. 91150Q-91150Q-91157.Google Scholar
Huaman, J.L.C., Sato, K., Kurita, S., Matsumoto, T., Jeyadevan, B., Copper nanoparticles synthesized by hydroxyl ion assisted alcohol reduction for conducting ink, Journal of Materials Chemistry, 21 (2011) 7062–7069.CrossRefGoogle Scholar
Varghese, O.K., Malhotra, L., Sharma, G., High ethanol sensitivity in sol–gel derived SnO2 thin films, Sensors and Actuators B: Chemical, 55 (1999) 161–165.Google Scholar
Miao, D., Zhao, Q., Wu, S., Wang, Z., Zhang, X., Zhao, X., Effect of substrate temperature on the crystal growth orientation of SnO2: F thin films spray-deposited on glass substrates, Journal of Non-Crystalline Solids, 356 (2010) 2557–2561.CrossRefGoogle Scholar
Sujatha, C., Rao, G.M., Uthanna, S., Characteristics of indium tin oxide films deposited by bias magnetron sputtering, Materials Science and Engineering: B, 94 (2002) 106–110.CrossRefGoogle Scholar
Agashe, C., Mahamuni, S., Competitive effects of film thickness and growth rate in spray pyrolytically deposited fluorine-doped tin dioxide films, Thin Solid Films, 518 (2010) 4868–4873.CrossRefGoogle Scholar
Moss, T.S., Optical properties of semi-conductors, Butterworths, London, 1959.Google Scholar