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On the Kinetics of Oxygen Clustering and Thermal Donor Formation in Czochralski Silicon

Published online by Cambridge University Press:  28 February 2011

T. Y. Tan ,
R. Kleinhenz  and
C. P. Schneider
T. Y. Tan
Affiliation:
IBM Thomas J. Watson Research Center, Yorktown Heights, NY 10598
R. Kleinhenz
Affiliation:
IBM General Technology Division, Hopewell Junction, NY 12533
C. P. Schneider
Affiliation:
IBM General Technology Division, Hopewell Junction, NY 12533
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Abstract

We report the results of an experiment of annealing Czochralski silicon at 450°C for up to 500 hrs. Concentrations of oxygen atoms (Ci) and thermal donors (TD) have both been monitored. Analyses of the oxygen concentration data yielded the apparent interpretation that the overall kinetics is dominated by the formation of small clusters (dimers and trimers). This cannot account for TD formation, since they are supposed to be larger clusters. On the other hand, analyses of existing TD kinetic models did not yield calculated Ci values to satisfactorily account for the present Ci data. We believe that a satisfactory TD model is not yet available.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 59: Symposium K – Oxygen, Carbon, Hydrogen and Nitrogen in Crystalline Silicon , 1985 , 195
Copyright
Copyright © Materials Research Society 1986

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References

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