Hostname: page-component-78c5997874-v9fdk Total loading time: 0 Render date: 2024-11-05T09:57:22.440Z Has data issue: false hasContentIssue false

Nucleation And Growth of Yttria-Stabilized Zirconia Thin Films Using Combustion Chemical Vapor Deposition

Published online by Cambridge University Press:  11 February 2011

Zhigang Xu
Affiliation:
NSF Center for Advanced materials and Smart Structures, North Carolina A&T State University, Greensboro, NC 27411
Jag Sankar
Affiliation:
NSF Center for Advanced materials and Smart Structures, North Carolina A&T State University, Greensboro, NC 27411
Sergey Yarmolenko
Affiliation:
NSF Center for Advanced materials and Smart Structures, North Carolina A&T State University, Greensboro, NC 27411
Qiuming Wei
Affiliation:
NSF Center for Advanced materials and Smart Structures, North Carolina A&T State University, Greensboro, NC 27411 Department of Mechanical Engineering, The Johns Hopkins University, Baltimore, MD 21218
Get access

Abstract

Liquid fuel combustion chemical vapor deposition technique was successfully used for YSZ thin film processing. The nucleation rates were obtained for the samples processed at different temperatures and total-metal-concentrations in the liquid fuel. An optimum substrate temperature was found for the highest nucleation rate. The nucleation rate was increased with the total-metal-concentration. Structural evolution of the thin film in the early processing stage was studied with regard to the formation of nuclei, crystallites and final crystals on the films. The films were found to be affected by high temperature annealing. The crystals and the thin films were characterized with scanning electron microscopy.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Singhal, S.C., MRS Bulletin, 25(3), 22(2000)Google Scholar
2. Blomen, L. J.M.J and Mugerwa, M. N., Fuel Cell Systems, New York, Plenum Press, 1993 Google Scholar
3. Chang, R.P.H, Nelson, D., and Hiraki, A., Technology update on diamond films, MRS Proceedings (EA-19), 1990 Google Scholar
4. Narayan, J., JMR, 5, 2414(1990)Google Scholar
5. Chen, X., Narayan, J., J. Appl. Phys. 74, 4168(1992)Google Scholar
6. Lin, H. and Dandy, D.S., Diamond Relat. Mater. 4, 1173(1995)Google Scholar
7. Lambrecht, W. R. L., Lee, C.H., Segall, B., Angus, J.C., Li, Z. and Sunkara, M., Nature, 364, 607(1993)Google Scholar
8. Xu, Z., Wei, Q. and Sankar, J., in Mechanisms of Surface and Microstructure Evolution in Deposited Films and Film Structures, MRS proceedings 2001 Spring (O8.29)Google Scholar
9. Neugebauer, C.A., in Handbook of Thin Film Technology, ed. Maissel, L.I, Glang, R. Chpt. 8, New York, McGraw-Hill, 1970 Google Scholar
10. Thompson, C.V., In Annu. Rev. Mater. Sci., 30, 159(2000)Google Scholar