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Non-lithographic Nanocolumn Fabrication with Application to Field Emitters

Published online by Cambridge University Press:  17 March 2011

M. J. Colgan ,
D. Vick  and
M. J. Brett
M. J. Colgan
Affiliation:
Department of Electrical and Computer Engineering, University of Alberta Edmonton, AB, CANADA, T6G 2G7
D. Vick
Affiliation:
Department of Electrical and Computer Engineering, University of Alberta Edmonton, AB, CANADA, T6G 2G7
M. J. Brett
Affiliation:
Department of Electrical and Computer Engineering, University of Alberta Edmonton, AB, CANADA, T6G 2G7
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Abstract

A non-lithographic method of fabricating high-density arrays of nanometer-scale vertical columns was investigated. The use of oblique deposition techniques allows the fabrication of isolated vertical columns in a single-step evaporation process without the need for either pre- or post-deposition lithographic processing. Extreme oblique incidence deposition with computer controlled substrate motion was utilized to fabricate columns with diameters near 100 nm and densities exceeding 109 columns/cm2. The desired column geometry may be engineered through choice of deposition angle and substrate spin rate. In one potential application of these microstructures, arrays of vertical columns were fabricated from silicon and carbon and tested for field emission characteristics. Further studies were made on the use of ion milling to modify the tips of the nanocolumns in order to improve the field emission properties.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 636: Symposium D – Nonlithographic and Lithographic Methods of Nanofabrication-From Ultralarge Scale , 2000 , D9.24.1
Copyright
Copyright © Materials Research Society 2001

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