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Non Destructive Optical Analysis of Implanted Layers in GaAs by Raman Scattering and Spectroscopic Ellipsometry

Published online by Cambridge University Press:  15 February 2011

Joseph Biellmann
Affiliation:
Laboratoire de Spectroscopie et d'Optique du Corps Solide(L.A. No 232 - CNRS) 5, rue de l'Université, 67000 Strasbourg, FRANCE
Bernard Prevot
Affiliation:
Laboratoire de Spectroscopie et d'Optique du Corps Solide(L.A. No 232 - CNRS) 5, rue de l'Université, 67000 Strasbourg, FRANCE
Claude Schwab
Affiliation:
Laboratoire de Spectroscopie et d'Optique du Corps Solide(L.A. No 232 - CNRS) 5, rue de l'Université, 67000 Strasbourg, FRANCE
Jean-Bernard Theeten
Affiliation:
L.E.P., B.P. 15, 94450 Limeil-Brévannes, FRANCE
Marko Erman
Affiliation:
L.E.P., B.P. 15, 94450 Limeil-Brévannes, FRANCE
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Abstract

Non destructive analysis by Raman Scattering (RS) and Spectroscopic Ellipsometry (SE) is demonstrated on B+- and Se+ shallow implanted GaAs. Qualitative informations are obtained from 1st and 2nd order RS spectra. The former are analysed using the intensity ratio of the T0 and L0 modes, which defines a lattice potential perfection scale. The SE analysis of the E1, E11 structure in the imaginary part of the dielectric function confirms the RS results and its multilayer analysis yields the depth profile of the implanted ions.

Type
Research Article
Copyright
Copyright © Materials Research Society 1982

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References

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