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New method of photochemical adhesion of fused silica glasses by using Xe2 excimer lamp

Published online by Cambridge University Press:  01 February 2011

Takayuki Funatsu ,
Yuji Sato ,
Yoshiaki Okamoto  and
Masataka Murahara
Takayuki Funatsu
Affiliation:
[email protected], Tokyo Institute of Technology, Mechanical Sciences and Engineering, 2-12-1 O-okayama, Meguro-ku Tokyo, 152-8550, JAPAN, Tokyo, N/A, Japan
Yuji Sato
Affiliation:
[email protected], Tokyo Institute of Technology, Entropia Laser Initiative, 2-12-1 O-okayama, Meguro-ku, Tokyo, 152-8552, Japan
Yoshiaki Okamoto
Affiliation:
[email protected], Okamoto Optic Co,, 8-34 Haramachi, Isogo-ku, Yokohama,, Kanagawa, 235-0008, Japan
Masataka Murahara
Affiliation:
[email protected], Tokyo Institute of Technology, Entropia Laser Initiative, 2-12-1 O-okayama, Meguro-ku, Tokyo, 152-8552,, Japan
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Abstract

A strong adhesion of two silica glasses or a silica glass and a different glass that creates properties of heatproof, no adhesive strain, and high transmittance in the region of ultraviolet [UV] was demonstrated with photochemical reaction by vacuum-ultraviolet [V-UV] light. It was confirmed that the adhesive strength of the silicone oil between the two silica glasses enhanced to 18 [MPa] after irradiation from 0 [MPa] before irradiation, that of the SiO2 and BK7 to 12.3 [MPa], and that of the SiO2 and TEMPAX®, to 10 [MPa], and that of the SiO2 and CLEARCERAM® to 7.4 [MPa]. Furthermore, the adhesive strain of the bonded sample was measured by 3-dimension roughness meter (ZYGO), and the results showed no adhesive strain. This sample had the bonding strength at 500 degrees Celsius.

Keywords

adhesionbondingphotochemical
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1054: Symposium FF – Synthesis and Surface Engineering of Three-Dimensional Nanostructures , 2007 , 1054-FF05-31
Copyright
Copyright © Materials Research Society 2008

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References

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