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New Method for a Lensless Electron Microscope: Achieving High Resolution and Overcoming Effects of Multiple Scattering

Published online by Cambridge University Press:  22 February 2011

S. Y. Tong ,
H. Huang  and
Hua Li
S. Y. Tong
Affiliation:
Department of Physics and Laboratory for Surface Studies University of Wisconsin-Milwaukee, Milwaukee, WI 53201
H. Huang
Affiliation:
Department of Physics and Laboratory for Surface Studies University of Wisconsin-Milwaukee, Milwaukee, WI 53201
Hua Li
Affiliation:
Department of Physics and Laboratory for Surface Studies University of Wisconsin-Milwaukee, Milwaukee, WI 53201
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Abstract

We present the processes necessary for the development of a lensless electron microscope with a resolution of ≤ 0.6Å and an image position accuracy of ≤ 0.3Å. The technique inverts interference fringes of emitted electrons from localized sources embedded in a material. Unlike conventional methods which use the Helmholtz-Kirchhoff integral theorem, the new process starts with 3-dimensional Fourier transformation with phaseshift correction, SWEEP for forward-scattering electrons and REEP for back-scattering electrons. These processes are applicable to strong multiple scattering systems as well as systems whose source atoms are buried below the surface. Materials with long-range or local order can be studied; coupled to a small spot-sized incident beam, images of disordered materials can be formed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 208: Symposium J – Advances in Surface and Thin Film Diffraction , 1990 , 13
Copyright
Copyright © Materials Research Society 1991

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References

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