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Near-Field Second Harmonic Microscopy of Thin Ferroelectric Films

Published online by Cambridge University Press:  10 February 2011

I. I. Smolyaninov ,
H. Y. Liang ,
C. H. Lee ,
C. C. Davis ,
L. D. Rotter  and
D. L. Kaiser
I. I. Smolyaninov
Affiliation:
Electrical and Computer Engineering Department, University of Maryland, College Park, MD 20742, [email protected]
H. Y. Liang
Affiliation:
Electrical and Computer Engineering Department, University of Maryland, College Park, MD 20742, [email protected]
C. H. Lee
Affiliation:
Electrical and Computer Engineering Department, University of Maryland, College Park, MD 20742, [email protected]
C. C. Davis
Affiliation:
Electrical and Computer Engineering Department, University of Maryland, College Park, MD 20742, [email protected]
L. D. Rotter
Affiliation:
Ceramics Division, NIST, Gaithersburg, MD 20899–8522
D. L. Kaiser
Affiliation:
Ceramics Division, NIST, Gaithersburg, MD 20899–8522
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Abstract

Near-field second harmonic microscopy is ideally suited for studies of local nonlinearity and poling of ferroelectric materials at the microscopic level. Its main advantages in comparison with other scanning probe techniques are the possibility of fast time-resolved measurements, and substantially smaller perturbation of the sample under investigation caused by the optical probe. We report second harmonic imaging of the surface of thin BaTiO3 films obtained in a near-field microscopy setup using a Ti:sapphire laser system consisting of an oscillator and a regenerative amplifier operating at 810 nm. Optical resolution on the order of 80 nm has been achieved.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 596: Symposium Y – Ferroelectric Thin Films VIII , 1999 , 333
Copyright
Copyright © Materials Research Society 2000

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References

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