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Nanoline Templating of metals and the underlying surface processes

Published online by Cambridge University Press:  01 February 2011

James Hugh Gervase Owen  and
Kazushi Miki
James Hugh Gervase Owen
Affiliation:
[email protected], National Institute for Materials Science, International Centre for Young Scientists, 1-1 Namiki, Tsukuba, 305-0051, Japan, +81-29-851-3354 x8903, +81-29-860-4706
Kazushi Miki
Affiliation:
[email protected], National Institute for Materials Science, Nanomaterials Laboratory, 1-1 Namiki, Tsukuba, 305-0051, Japan
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Abstract

Bi nanolines, which self-assemble on Si(001), have been used as templates for the deposition of a variety of metals: noble metals, transition metals, and Gr. III metals. The different metals show a variety of behaviours on this surface, from a strong interaction in the case of In and Al, to a very weak interaction in the case of Ag. The different phenomena are discussed in terms of a balance of different competing surface mechanisms, such as diffusion and nucleation, which drives the observed behaviours.

Keywords

atomic layer depositionnanostructurescanning probe microscopy (SPM)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 961: Symposium O – Nanostructured and Patterned Materials for Information Storage , 2006 , 0961-O15-07
Copyright
Copyright © Materials Research Society 2007

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