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Nanolayer Reactions in Aluminum-Metal Interfaces

Published online by Cambridge University Press:  25 February 2011

E. V. Barrera ,
M. W. Ruckman  and
S. M. Heald
E. V. Barrera
Affiliation:
Division of Materials Science, Department of Applied Science, Brookhaven National Laboratory, Upton, NY 11973
M. W. Ruckman
Affiliation:
Division of Materials Science, Department of Applied Science, Brookhaven National Laboratory, Upton, NY 11973
S. M. Heald
Affiliation:
Division of Materials Science, Department of Applied Science, Brookhaven National Laboratory, Upton, NY 11973
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Abstract

Surface extended x-ray absorption fine structure (SEXAFS) measurements on the nanometer level were made for AI/M interfaces where M was Cu or Ni. The samples were studied immediately after deposition and after heat treatments. Significant differences in interface reactions were observed depending on deposition direction (Cu on Al or Al on Cu) and the amount of mixing was also related to whether M was Cu or Ni. The SEXAFS measurements revealed that there were no detectable amounts of C or O present. One percent Zn was observed to be in the Al layers. The results obtained from the as-deposited interfaces correlate well with data obtained from buried interfaces of like element combinations.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 159: Symposium C – Atomic Scale Structure of Interfaces , 1989 , 69
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

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