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Nano-Columnar Mg Thin Films Created by Plasma Sputter Deposition for Improved Hydrogen Kinetics and Storage Properties

Published online by Cambridge University Press:  01 February 2011

M. W. Zandbergen
Affiliation:
Faculty of Applied Sciences, Delft University of Technology, Mekelweg 15, NL-2629 JB Delft, The Netherlands
S. W. H. Eijt
Affiliation:
Faculty of Applied Sciences, Delft University of Technology, Mekelweg 15, NL-2629 JB Delft, The Netherlands
W. J. Legerstee
Affiliation:
Faculty of Applied Sciences, Delft University of Technology, Mekelweg 15, NL-2629 JB Delft, The Netherlands
H. Schut
Affiliation:
Faculty of Applied Sciences, Delft University of Technology, Mekelweg 15, NL-2629 JB Delft, The Netherlands
V. L. Svetchnikov
Affiliation:
Kavli Institute of Nanoscience, Delft University of Technology, Lorentzweg 1, NL-2628 CJ Delft, The Netherlands
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Abstract

The hydrogen storage properties of nanostructured Mg and MgH2 thin films were studied as created by Ar and Ar+H2 plasma sputter deposition. Columnar structures with typical widths of ∼120 nm are observed with their long columnar axis extending throughout the thickness of the films. Applying substrate bias voltages during deposition results in narrower columns. A concomitant reduction in hydrogen desorption temperature from 400 °C to 360 °C is observed. Capping the Mg films with a ∼100 nm thin Pd layer leads to significantly reduced hydrogen desorption temperatures of ∼200 °C induced by the catalytic activity of the Pd cap layer. Also, hydrogen permeation of the films is strongly improved. The rate-determining factor is found to be the dissociation of the hydrogen molecules. Optimum hydrogen loading conditions of the Pd/Mg films were obtained just above ∼200 °C at hydrogen pressures of 0.25–1.0 MPa, resulting in hydrogen storage capacities in the range of 4–7 wt%.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

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References

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