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Molecular Beam Mass Spectrometry Studies of the Thermal Decomposition of Tetrakis(dimethylamino)Titanium

Published online by Cambridge University Press:  10 February 2011

Carmela C. Amato-Wierda ,
Edward T. Norton Jr  and
Derk A. Wierda
Carmela C. Amato-Wierda*
Affiliation:
University of New Hampshire, Materials Science Program, Durham, NH
Edward T. Norton Jr
Affiliation:
University of New Hampshire, Materials Science Program, Durham, NH
Derk A. Wierda
Affiliation:
Saint Anselm College, Department of Chemistry, Manchester, NH
*
Author to whom correspondence should be addressed
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Abstract

Tetrakis(dimethylamino)titanium (TDMAT) is an important precursor for TiN, TiCN, and TiSiN thin films in chemical vapor deposition. In order to better understand how the gas phase chemistry influences the formation of these films, the decomposition of TDMAT has been studied in a high-temperature flow reactor (HTFR) by molecular beam mass spectrometry (MBMS). Two kinetic regimes have been observed as a function of temperature. Rate expressions and mechanistic implications will be presented. Further studies are in progress to identify the gas phase species relevant to the decomposition mechanism of TDMAT.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 606: Symposium NN – Chemical Processing of Dielectrics, Insulators & Electronic Ceramics , 1999 , 103
Copyright
Copyright © Materials Research Society 2000

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References

1 Smith, P. M. and Custer, J.S., Appl. Phys. Lett. 70, 3116 (1997).Google Scholar
2 Reid, J.S., Amorphous ternary diffusion barriers for silicon metallizations. Ph.D. Thesis, California Institute of Technology, May, 1995.Google Scholar
3 (a) Sun, X., Reid, J.S., Kolawa, E., and Nicolet, M.A., J. Appl. Phys. 81, 656 (1997). (b) X. Sun, J.S. Reid, E. Kolawa, and M.A. Nicolet, J. Appl. Phys. 81, 664 (1997).Google Scholar
4 Raaijmakers, I.J., Thin Solid Films 247, 85 (1994).Google Scholar
5 Weiller, B. H. J. Am. Chem. Soc. 1996, 118, 4975–4983 Google Scholar