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Modelling the Structure of Ion Bombarded Binary Alloys

Published online by Cambridge University Press:  16 February 2011

Paolo M. Ossi
Paolo M. Ossi*
Affiliation:
Dipartimento di Ingegneria Nucleare, Politecnico di Milano, Via Ponzio 34/3, 20133 Milano; Unità cINFM di Trento, 38050 Povo (TN), Italy
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Abstract

An atomistic model of phase formation in ion bombarded thin binary metallic films is discussed. Compositional changes occur at the interface between collision cascades and crystal matrix. Relaxation arises via elementary charge transfer reactions, with formation of dimers of an effective compound. Comparing surface and thermochemical properties of initial and effective alloys, a set of conditions specific to vitrification and respectively tocrystal formation under ion bombardment is obtained.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 373: Symposium Y – Microstructure of Irradiated Materials , 1994 , 27
Copyright
Copyright © Materials Research Society 1995

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References

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