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Modeling of Film Growth in Pulsed Laser Deposition

Published online by Cambridge University Press:  15 February 2011

M. Tyunin
M. Tyunin*
Affiliation:
Institute of Solid State Physics, Latvian University, 8 Kengaraga, LV-1063, Riga, Latvia
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Abstract

Film growth in pulsed laser deposition (PLD) is described as a process of sorption of ablated species on the substrate surface. Film growth rate and composition are qualitatively analyzed as a function of laser fluence and ambient gas pressure. As an example, analysis of the film composition is carried out for BiSrCaCuO and PbZrTiO pulsed laser deposited films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 397: Symposium B – Advanced laser Processing of Materials-Fundamentals and Applications , 1995 , 187
Copyright
Copyright © Materials Research Society 1996

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References

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