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A Model of a Combined Film Deposition and Ion Bombardment for Coatings Formation

Published online by Cambridge University Press:  25 February 2011

Z. A. Iskanderova ,
T. D. Radjabov ,
R. Yu. Leiderman  and
F. K. Tukfatullin
Z. A. Iskanderova
Affiliation:
Institute of Electronics, Uzbek Academy of Sciences, Academgorodok, 700143, Tashkent, USSR
T. D. Radjabov
Affiliation:
Institute of Electronics, Uzbek Academy of Sciences, Academgorodok, 700143, Tashkent, USSR
R. Yu. Leiderman
Affiliation:
Institute of Electronics, Uzbek Academy of Sciences, Academgorodok, 700143, Tashkent, USSR
F. K. Tukfatullin
Affiliation:
Institute of Electronics, Uzbek Academy of Sciences, Academgorodok, 700143, Tashkent, USSR
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Abstract

The mathematical model of a combined film deposition and and high dose ion implantation for coating formation has been developed. Calculations of concentration profiles of implanted element in the film and substrate depending on different parameters of the model have been carried out.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 128: Symposium A – Processing and Characterization of Materials Using Ion Beams , 1988 , 169
Copyright
Copyright © Materials Research Society 1989

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References

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