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Microstructures of Chemical-Vapour-Deposited Tin Films

Published online by Cambridge University Press:  15 February 2011

Noboru Yoshikawa  and
Atsushi Kikuchi
Noboru Yoshikawa
Affiliation:
Department of Metallurgy, Faculty of Engineering, Tohoku University, Aza-Aoba, Aramaki, Aoba-ku, Sendai, Miyagi, Japan980
Atsushi Kikuchi
Affiliation:
Department of Metallurgy, Faculty of Engineering, Tohoku University, Aza-Aoba, Aramaki, Aoba-ku, Sendai, Miyagi, Japan980
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Abstract

A gas mixture consisting of TiCl4, H2 and N2 was fed into an externally-heated steel tube, and TiN was deposited on the inner wall by CVD. Microstuctures of the films were observed and their relationships with the preferred crystal orientations were studied. Distributions of the film growth rate and gas concentrations along the axial direction were calculated.

By comparing the film microstructures with the calculated local deposition conditions, it is shown that formation of the films with (110) preferred orientation correlated with the conditions at high temperature and low partial pressure of TiCl4 on the substrate.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 343: Symposium H – Polycrystalline Thin Films - Structure, Texture, Properties and Applications , 1994 , 741
Copyright
Copyright © Materials Research Society 1994

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References

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