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Microstructure of BaTiO3 Thin Films Grown by Reduced-Pressure CVD

Published online by Cambridge University Press:  25 February 2011

Peter C. Van Buskirk ,
Robin Gardiner  and
Peter S Kirlin
Peter C. Van Buskirk
Affiliation:
Advanced Technology Materials, 520-B Danbury Road, New Milford, CT. 06776
Robin Gardiner
Affiliation:
Advanced Technology Materials, 520-B Danbury Road, New Milford, CT. 06776
Peter S Kirlin
Affiliation:
Advanced Technology Materials, 520-B Danbury Road, New Milford, CT. 06776
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Abstract

Polcrystalline BaTiO3 films have been grown on NdGaO3 [100], SrTiO3 [100] and Si [100] substrates by reduced pressure CVD. The substrate temperature was 1000°C and the total pressure during growth was 4 torr. X-ray diffraction measurements indicate highly textured films on the NdGa03 substrate. The orientation was predominantly [100], accompanied by small quantities of various TiO crystalline phases.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 202: Symposium C – Evolution of Thin Film and Surface Microstructure , 1990 , 235
Copyright
Copyright © Materials Research Society 1991

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References

REFERENCES

1 Landolt-Bornstein Numerical Data and Functional Relationships in Science and Technology. New Series, III/11, Hellwege, K.H., ed., pp. 682, 685 (1979)Google Scholar
2 “Desirability of electro-optic materials for guided-wave optics”, Holman, R.L., Johnson, L.M., Skinner, D.P., Optical Eng., 26(2), pp. 134–142 (1987)Google Scholar
3 “Preparation and Properties of Thin Barium Titanate Films”, Feuersanger, A.E., J. Electrochem. Soc, 111(12), pp. 1387–1391, (1964)Google Scholar
4 “Electrical properties of flash evaporated BaTi03 thin films”, Slack, J.R., Burfoot, J.C., J. Phys. C: Solid State Physics, 4, pp. 898–909 (1971)Google Scholar
5 “Preparation of ferroelectric BaTiO3 thin films by activated reactive evaporation”, Iijima, K., Terashima, T., et. al., Applied Physics Letters, 56(6), pp. 527–529, (1990)Google Scholar
6 “Structural and electrical properties of rf-sputtered amorphous barium titanate thin films”, Sreenivas, K., Mansingh, A., sayer, M., J. Appl. Phys. 62(11), pp. 4476–4481 (1987)Google Scholar
7 “Growth of BaTiO3-SrTiO3 thin films by R.F. magnetron sputtering”, Fujimoto, K., Kobayashi, Y., Kubota, K., Thin Solid Films 169, pp. 249–256 (1989)Google Scholar
8 “Pulsed laser deposition of barium titanate films on silicon”, Nawathey, R., et. al., Solid State Comm., 71(1), pp. 9–12 (1989)Google Scholar
9 “Epitaxial growth of BaTiO3 thin films using laser ablation”, Davis, G.M., Gower, M.C., Applied Physics Letters, 55(2), pp. 112–114, (1989)Google Scholar
10 “CVD in Stagnation Point Flow”, Houtman, D.B., Graves, D.B., Jensen, K.F., J. Electrochemical Soc, 133, pp. 961 (1986)Google Scholar
11 “Low Pressure MOCVD of c-axis oriented BiSrCaCuO Thin Films”; Hamaguchi, N., Vigil, J., Gardiner, R., Kirlin, P.S., Jpn. J. Appl. Phys., 29(4), pp. L596–599 (1990)Google Scholar
12 “Epitaxial films of YBaCuO7-x on NdGaO3, LaGaO3, and SrTiO3 substrates by laser ablation.” Koren, G. et al., Appl. Phvs. Lett. 1989, 54, 1054.Google Scholar
13 “JCPDS Powder Diffraction File, Int. Center for Diffraction Data, 1982 Google Scholar