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Microstructure and Recording Noise of Thin Film Longitudinal Media

Published online by Cambridge University Press:  15 February 2011

Tadashi Yogi ,
Thao A. Nguyena ,
Steven E. Lambert ,
Grace L. Gorman  and
Gil Castillo
Tadashi Yogi
Affiliation:
Magnetic Recording Institute
Thao A. Nguyena
Affiliation:
Magnetic Recording Institute
Steven E. Lambert
Affiliation:
Magnetic Recording Institute
Grace L. Gorman
Affiliation:
IBM Research Division Almaden Research Center San Jose, CA 95120-6099, USA
Gil Castillo
Affiliation:
Magnetic Recording Institute
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Abstract

The magnetic and recording characteristics of Co-based thin film media are strongly influenced by microstructure. The media microstructural characteristics, in turn, depend on sputtering conditions of underlayers and magnetic layers. The role of Cr underlayer thickness and sputtering pressure have been reported previously. The present work examines the growth morphology and recording properties of a CoPtCr alloy on Cr underlayers where the deposition conditions such as sputtering pressure and rf bias were independently varied for the Cr underlayer and the magnetic layer. We find that the growth morphology of the magnetic layer is governed primarily by the deposition condition of the Cr underlayer. In particular, increased sputtering pressure for the Cr underlayer produces columnar morphology which induces isolation of the grains in the magnetic layer. This results in a significant reduction in the recording noise due to reduced intergrain exchange coupling. On the other hand, the application of ff bias during the deposition of the magnetic layer promotes more continuous magnetic grains, thereby increasing the recording noise. The observed trends in microstructure and recording noise can be understood qualitatively in terms of Thornton's microstructure diagram and the competition between micromorphological roughness and adatom mobility during the film growth.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 232: Symposium T – Magnetic Materials: Microstructure and Properties , 1991 , 3
Copyright
Copyright © Materials Research Society 1991

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References

REFERENCES

[1] Sanders, I.L. and Lambert, S.E., IEEE Proc. VLSI and Comp. Periph., 1–12 (1989).Google Scholar
[2] Tsang, C., Chen, M.M., Yogi, T. and Ju, K., IEEE Trans. Magn., 26, 1689 (1990).CrossRefGoogle Scholar
[3] Yogi, T., Tsang, C., Nguyen, T.A., Ju, K., Gorman, G.L. and Castillo, G., IEEE Trans. Magn., 26, 2271 (1990).CrossRefGoogle Scholar
[4] Howell, T.D., McCown, D.P., Diola, T.A. and Tang, Y.S., IEEE Trans. Magn., 26, 2298 (1990).CrossRefGoogle Scholar
[5] Yogi, T., Gorman, G.L., Hwang, C., Kakalec, M.A. and Lambert, S.E., IEEE Trans. Magn., 24, 2727 (1988).CrossRefGoogle Scholar
[6] Natarajan, B.R. and Murdock, E.S., IEEE Trans. Magn., 24, 2724 (1988).CrossRefGoogle Scholar
[7] Ranjan, R., Christner, J.A. and Ravipati, D.P., IEEE Trans. Magn., 26, 322 (1990).CrossRefGoogle Scholar
[8] Werner, A., Hibst, H. and Mannsperger, H., IEEE Trans. Magn., 26, 115 (1990).CrossRefGoogle Scholar
[9] Johnson, K.E., Ivett, P.R., Timmons, D.R., Mirzamaani, M., Lambert, S.E., and Yogi, T., J. Appl. Phys. 67, 4686 (1990)CrossRefGoogle Scholar
[10] Chen, T. and Yamashita, T., IEEE Trans. Magn., 24, 2700 (1988).CrossRefGoogle Scholar
[11] Yogi, T., Nguyen, T.A., Lambert, S.E., Gorman, G.L. and Castillo, G., IEEE Trans. Magn. 26, 1578 (1990).CrossRefGoogle Scholar
[12] Howard, J.K., J. of Vac. Sci. Technol. A,4, 1(1986)CrossRefGoogle Scholar
[13] Shiroishi, Y., Matsuda, Y., Yoshida, K., Suzuki, H., Ohno, T., Tsumita, N., Ohura, M. and Hayashi, M. IEEE Trans. Magn., 24, 2730 (1988).CrossRefGoogle Scholar
[14] Furusawa, K., Kataoka, H., Takagaki, T., Abe, K., Shiroishi, Y., Funamoto, S., Kojima, S. and Hayashi, M. IEEE Trans. Magn., 26, 2283 (1990).CrossRefGoogle Scholar
[15] Hashimoto, M., Murata, Y., Tani, N., Ishikawa, M., Ota, Y., Nakamura, K. and Itoh, A., Digests of the 12th Annual Conference on Magnetics in Japan , 25 (1988).Google Scholar
[16] Ishikawa, M., Terao, K., Hashimoto, M., Tani, N., Ota, Y. and Nakamura, K. IEEE Trans. Magn. ,26, 1602 (1990).CrossRefGoogle Scholar
[17] Pressesky, J.L., Lee, S.Y., Duan, S.L. and Williams, D., To be published in J. Appl. Phys. Paper DA-06 at MMM Conference, San Diego, CA (1990).Google Scholar
[18] Christner, J.A., Rajan, R., Peterson, R.L. and Lee, J.I., J. Appl. Phys., 63, 3260 (1988).CrossRefGoogle Scholar
[19] Khan, M.R., Lee, S.Y., Pressesky, J.L., Williams, D., Duan, S.L., Fisher, R.D. and Heiman, N., IEEE Trans. Magn., 26, 2715 (1990).CrossRefGoogle Scholar
[20] Hata, H., Hyohno, T., Fukuichi, T., Yabushita, K., Umesaki, M., and Shibata, H., IEEE Trans. Magn., 26, 2709 (1990).CrossRefGoogle Scholar
[21] Lambert, S.E., Howard, J.K., and Sanders, I.L., IEEE Trans. Magn., 26, 2706 (1990).CrossRefGoogle Scholar
[22] Murdock, E.S., Natarajan, B.R., and Walmsley, R.G. IEEE Trans. Magn. , 26, 2700 (1990).CrossRefGoogle Scholar
[23] Hughes, G.R. J. Appl. Phys., 54, 5306 (1983).CrossRefGoogle Scholar
[24] Zhu, J.G. and Bertram, H.N., IEEE Trans. Magn., 24, 2706 (1988).CrossRefGoogle Scholar
[25] Giles, R. and Mansuripur, M., Paper BA-02 at MMM Conference, San Diego, CA (1990).Google Scholar
[26] Beardsley, I.A. and Speriosu, V.S., IEEE Trans. Magn., 26, 2718 (1990).CrossRefGoogle Scholar
[27] Zhu, J.G., Paper to be presented at MMM-Intermag, Pittsburgh, PA (1991).Google Scholar
[28] Alexopoulos, P.S. and Geiss, R.H., IEEE Trans. Magn., MAG–2, 566 (1986).CrossRefGoogle Scholar
[29] Chapman, J.N., McFadyen, I.R. and McVitie, S., IEEE Trans. Magn., 26, 1506 (1990).CrossRefGoogle Scholar
[30] Chen, T., IEEE Trans. Magn., MAG–17, 1181 (1981).CrossRefGoogle Scholar
[31] Rugar, D., Mamin, H.J., Guethner, P., Lambert, S.E., Stem, J.E., McFadyen, I. and Yogi, T., J. Appl. Phys., 68, 1169 (1990).CrossRefGoogle Scholar
[32] VanZandt, T. and Browning, R., Paper BA-03 at MMM Conference, San Diego, CA (1990).Google Scholar
[33] Mayo, P.I., O'Grady, K., Cambridge, J., Sanders, I.L., Yogi, T., Kelly, P.E., and Chantrell, R.W., Paper BA-11 at MMM Conference, San Diego, CA (1990).Google Scholar
[34] Rossnagel, S.M., J. Vac. Sci. Technol. A, 6, 3049 (1988).CrossRefGoogle Scholar
[35] Nguyen, T.A., Yogi, T. and Lambert, S.E., To be presented at the 13th International colloquium on Magnetic Films and Surfaces, Glasgow, UK, Aug. 26–30 (1991).Google Scholar
[36] Thornton, J.A., J. Vac. Sci. Technol., A4, 3059 (1986).CrossRefGoogle Scholar