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Microstructure and Magneto-Optical Properties of TbFeCo Films Prepared by Facing Targets Sputtering

Published online by Cambridge University Press:  21 February 2011

H. Ito ,
T. Hirata  and
M. Naoe
H. Ito
Affiliation:
Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 0-okayama, Meguro-ku, Tokyo 152, Japan
T. Hirata
Affiliation:
Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 0-okayama, Meguro-ku, Tokyo 152, Japan
M. Naoe
Affiliation:
Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 0-okayama, Meguro-ku, Tokyo 152, Japan
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Abstract

The microstructure of TbFeCo amorphous films deposited by a facing targets type of sputtering (FTS) method varied with the change of deposition rate Rd. The films deposited at Rd of about 100–200 nm/min did not present any distinguishable columnar structure while the ones at Rd of about 50 nm/min revealed obvious columnar structure. The films with columnless structure exhibited Kerr rotation angle θk of 0.37 deg. of which the value was higher than that of the films with columnar structure over the wide range of Th content. The torque measurement implied that the presence of columnar structure was not mainly necessary for the occurrence of large perpendicular magnetic anisotropy. Under satisfactory confinement of plasma during sputtering, the dense, uniform and columnless TbFeCo films can be obtained on plasma-free substrate even at Rd as high as 200 nm/min, without destroying the excellent magnetic properties and magneto-optical characteristics.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 132: Symposium G – Multicomponent Ultrafine Microstructures , 1988 , 167
Copyright
Copyright © Materials Research Society 1989

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References

REFERENCES

[1] Ohkoshi, M., Harada, M., Tokunaga, Y., Honda, S., and Kusuda, T., IEEE Trans.Magn., MAG–21, 1635 (1985)Google Scholar
[2] Hong, M., Gyorgy, E.M., van Dover, R.B., Nakahara, S., Bacon, D.D. and Gallagher, P.K., J. Appl. Phys. 59, 551 (1986)Google Scholar
[3] Suzuki, T., Ichinose, H. and Aoyagi, E., Jpn. J. Appl. Phys. 23, 585 (1984)Google Scholar
[14] Lee, J-W., Shieh, H-P.D., Kryder, M.H., and Laughlin, D.E., J. Appl. Phys. 63, 3624 (1988)Google Scholar
[5] Shieh, H-P.D., Ilong, M. and Nakahara, S., J. Appl. Phys. 63, 3627 (1988)Google Scholar
[6] Yasugi, , Honda, S., Ohkoshi, M. and Kusuda, T., J. Appl. Phys. 52, 229 (1981)Google Scholar
[7] Togami, Y., Saito, N. and Okamoto, K., J. Appl. Phys. 60, 3691 (1986)Google Scholar
[8] Suzuki, T., J. Mag. Mag. Mat. 35, 232 (1983)Google Scholar
[9] Takeno, T., Suwabe, M., Sakurai, T. and Goto, K., Jpn. J. Appl. Phys. 25, L657 (1986)Google Scholar
[10] Nakahara, S., Hong, M.., van Dover, R.B., Gorgy, E.M. and Bacon, D.D., J. Vac. Sci. Technol. A4, 543 (1986)Google Scholar
[11] Naoe, M., Kitamura, N. and Ito, H., J. Appl. Phys. 63, 3850 (1988)Google Scholar
[12] Naoe, M., Yamanaka, S.I., and Hoshi, Y., IEEE Trans. Magn., MAG–16,646 (1980)Google Scholar
[13] Ito, H., Hirata, T., Kitamura, N. and Naoe, M.. J. Magn. Soc. Jpn.Vol.11 Supplement No.S1, 225 (1987)Google Scholar
[14] Leamy, H.J. and Dirks, G., J. Appl. Phys. 50, 2871 (1979)Google Scholar
[15] Wright, C.D., Grundy, P.J. and Lacey, E.T.M., 1EEE Trans. Magn. MAG–23, 162 (1987)Google Scholar
[16] Miyajima, H., Sato, K. and Mizoguchi, T., J. Appl. Phys. 47, 4669 (1976)Google Scholar