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Microstructure and Hydrogen Absorption/Desorption Behavior of Nanoporous Pd Thin Films

Published online by Cambridge University Press:  01 February 2011

Wen-Chung Li ,
Simone C. Schendel  and
T. John Balk
Wen-Chung Li
Affiliation:
[email protected], University of Kentucky, Chemical and Materials Engineering, 700 Woodland Ave. Apt. A-8, Lexington, KY, 40508, United States, 859-797-9539, 859-323-1929
Simone C. Schendel
Affiliation:
[email protected], University of Kentucky, Chemical and Materials Engineering, 177 F. Paul Anderson Tower, Lexington, KY, 40506-0046, United States
T. John Balk
Affiliation:
[email protected], University of Kentucky, Chemical and Materials Engineering, 177 F. Paul Anderson Tower, Lexington, KY, 40506-0046, United States
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Abstract

Nanoporous Pd (np-Pd) prepared from Pd-Ni alloy films on Si substrates was studied to understand hydriding/dehydriding processes in nanoscale Pd. Porous structures of the np-Pd thin films can be changed under different dealloying conditions. Stress measurement of the np-Pd showed that the np-Pd thin films can survive hydrogen pressures from 0 to 1 atm with no blistering, although this problem often occurs in dense Pd films in actual, high-pressure hydrogen environments. These tests indicated that hydrogen atoms can be stored in the np-Pd for much longer times than in fully dense Pd films subjected to ambient conditions. It is proposed that the stress distribution in np-Pd and the small pore size (<10 nm) inhibit hydrogen diffusion to free surfaces and thus prevent hydrogen degassing from the nanoporous structure. Moreover, phase transformation of Pd hydrides and effect of hydrogen trapping are also considered as possible reasons for the slow release of hydrogen.

Keywords

PdnanoscaleH
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1098: Symposium HH – The Hydrogen Economy , 2008 , 1098-HH02-08
Copyright
Copyright © Materials Research Society 2008

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