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Microstructural Imaging of Localized Chemical Reactions using Valence Photoelectrons

Published online by Cambridge University Press:  21 February 2011

S. Liang ,
A.K. Ray-Chaudhuri ,
W. Ng  and
F. Cerrina
S. Liang
Affiliation:
Center for X-ray Lithography, University of Wisconsin - Madison, 3731 Schneider Dr., Stoughton, WI 53589
A.K. Ray-Chaudhuri
Affiliation:
Center for X-ray Lithography, University of Wisconsin - Madison, 3731 Schneider Dr., Stoughton, WI 53589
W. Ng
Affiliation:
Center for X-ray Lithography, University of Wisconsin - Madison, 3731 Schneider Dr., Stoughton, WI 53589
F. Cerrina
Affiliation:
Center for X-ray Lithography, University of Wisconsin - Madison, 3731 Schneider Dr., Stoughton, WI 53589
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Abstract

We have utilized scanning soft X-ray photoelectron spectromicroscopy-MAXIMUM to investigate the microstructural evolution induced by localized corrosion in the Al-Cu-Si alloy thin films. We present energy-specific photoelectron micrographs showing the distribution of Cu-rich precipitates and corrosion products for the thin films after corrosion. Microspectroscopy performed across a corrosion site reveals that the O 2p valence band shifts in energy with location and the amount of shift can be related to the degree of corrosion. The photoelectron micrographs also show that the Cu-rich phase precipitates near the surface region and grows with annealing temperature.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 332: Symposium U – Determining Nanoscale Physical Properties of Materials by Microscopy and Spectroscopy , 1994 , 87
Copyright
Copyright © Materials Research Society 1994

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References

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