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The Microstructural Evolution of Nanometer Ruthenium Films in Ru/C Multilayers With Thermal Treatments

Published online by Cambridge University Press:  26 July 2012

Tai D. Nguyen ,
Ronald Gronsky  and
Jeffrey B. Kortright
Tai D. Nguyen
Affiliation:
Center for X-Ray Optics, Accelerator and Fusion Research Division, Lawrence Berkeley Laboratory, University of California, Berkeley, CA 34720 Department of Materials Science and Mineral Engineering, University of California, Berkeley, CA. 94720.
Ronald Gronsky
Affiliation:
Department of Materials Science and Mineral Engineering, University of California, Berkeley, CA. 94720.
Jeffrey B. Kortright
Affiliation:
Center for X-Ray Optics, Accelerator and Fusion Research Division, Lawrence Berkeley Laboratory, University of California, Berkeley, CA 34720
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Abstract

The evolution of nanometer Ru films sandwiched between various C layer thicknesses with thermal treatments was studied by plan-view and cross-sectional Transmission Electron Microscopy. Plan-view observation provides information on the Ru grain size, while crosssectional studies allow examination of the multilayer morphology. After annealing at 800°C for 30 minutes, the grain size in the 2 and 4 nm Ru layers show little difference from each other, while that in the I nm Ru layers depends strongly on the thickness of the C layers in the multilayers. It increases with decreasing C layer thickness. Agglomeration of the Ru layers is observed in Inmn Ru / 1nm C multilayers after annealing at 600°C for 30 minutes. The evolution of the microstructures and layered structure stability of the Ru/C system is compared to that of W/C and Ru/B4C systems.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 230: Symposium R – Phase Transformation Kinetics in Thin Films , 1991 , 109
Copyright
Copyright © Materials Research Society 1992

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