Hostname: page-component-78c5997874-ndw9j Total loading time: 0 Render date: 2024-11-16T17:18:27.584Z Has data issue: false hasContentIssue false

Microscopic Determination of Stress Distribution in Gaas Grown at Low Temperature on GaAs (100)

Published online by Cambridge University Press:  25 February 2011

Zuzanna Liliental-Weber
Affiliation:
Lawrence Berkeley Laboratory, 1 Cyclotron Rd., Berkeley, CA 94720
A. Ishikawa
Affiliation:
Institute of Scientific Measurements, Tohoku University, Sendai 980, Japan
M. Teriauchi
Affiliation:
Institute of Scientific Measurements, Tohoku University, Sendai 980, Japan
M. Tanaka
Affiliation:
Institute of Scientific Measurements, Tohoku University, Sendai 980, Japan
Get access

Abstract

A microscopic strain distribution across commensurate interfaces between GaAs layers grown on semi-insulating GaAs substrates was observed by means of convergent beam electron diffraction (CBED) and large angle convergent beam methods (LACBED). Strain relaxation at a specific distance from the interface was observed in these layers without formation of misfit dislocations. It was proposed that specific point defects distributed close to the interface can explain the asymmetric broadening of high-order Laue zone (HOLZ) lines in the CBED patterns.

Type
Research Article
Copyright
Copyright © Materials Research Society 1991

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Van der Merwe, J.H., J. Appl. Phys. 34, 123 (1962).Google Scholar
2. Matthews, J.W., Mader, S., and Light, T.B., J. Appl. Phys. 41, 3800 (1973).Google Scholar
3. Matthews, J.W. and Blakeslee, A.E., J. Cryst. Growth 27, 118 (1974).Google Scholar
4. Matthews, J.W., J. Vac. Sci. Technol. 12, 126 (1975).Google Scholar
5. People, R. and Bean, J.C., Appl. Phys. Lett. 47, 322 (1985).Google Scholar
6. Dodson, B.W. and Tsao, J.Y., Appl. Phys. Lett. 51, 1325 (1987).Google Scholar
7. Steeds, J.W., in ”Introduction to Analytical Electron Microscopy” Eds. Hren, J.J., Goldstein, J.I. and Joy, D.C. (Plenum, New York and London 1979), ch. 15.Google Scholar
8. Humphreys, C.J., Maher, D.M., Fraser, H.L., and Eaglesham, D.J., Phil. Mag., 58, 787, (1988).Google Scholar
9. Eaglesham, D.J., Maher, D.M., Fraser, H.L., Humphreys, C.J., and Bean, J.C., Appl. Phys. Lett. 54, 222 (1989).Google Scholar
10. Tanaka, M., Saito, R., Ueno, K., and Harada, Y., J. Electron Microsc., 29, 408 (1980).Google Scholar
11. Kaminska, M., Liliental-Weber, Z., Weber, E.R., George, T., Kortright, J.B., Smith, F.W., Tsaur, B.Y., and Calawa, A.R., Appl. Phys. Lett. 54, 1881 (1989).Google Scholar
12. Kaminska, M., Weber, E.R., Liliental-Weber, Z., Leon, R., and Rek, Z., J. Vac. Sci. Technol. B7, 710 (1989).Google Scholar
13. Liliental-Weber, Z., Mat. Res. Soc. Proc. vol. 198, p.371.Google Scholar
14. Liliental-Weber, Z., in: ”Proc. 12th International Congress for Electron Microscopy.” Ed. Bailey, G.W. (San Francisco Press, San Francisco 1990), vol. 4, p. 588.Google Scholar
15. Liliental-Weber, Z., Swider, W., Yu, K.M., Kortright, J.B., Smith, F.W., and Calawa, A.R., Appl. Phys. Lett., subm.f.publ.Google Scholar
16. Fraser, H.L., in: ”Proc. 49th Annual Meeting of the Electron Microscopy Soc. of America.” Ed. Bailey, G.W., (San Francisco Press, San Francisco 1989), p.518.Google Scholar
17. Gibson, J.M., Hull, R., and Bean, J.C., Appl. Phys. Lett. 48, 649 (1985).Google Scholar