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Micromagnetic Modeling of Released/Non-released Magnetostrictive Films

Published online by Cambridge University Press:  01 February 2011

Yi-Chung Shu  and
J. H. Yen
Yi-Chung Shu
Affiliation:
[email protected], National Taiwan University, Institute of Applied Mechanics, No.1, Sec. 4, Roosevelt Road, Taipei, N/A, 106, Taiwan, +886-2-3366-5627, +886-2-3366-5628
J. H. Yen
Affiliation:
Institute of Applied Mechanics, National Taiwan University, Taipei 106, Taiwan, R.O.C.
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Abstract

We study the magnetostrictive behavior of two types of films: one is released from the substrate but constrained from its lateral boundary and the other is attached to the substrate. The former is investigated using the recently developed micromagnetic model which is suitable for films subjected to realistic magneto-mechanical boundary conditions. The latter is modeled within a framework extended from our recent theoretical paper studying rough alloy films with composition modulation. We give an explicit form of the stress-induced magnetic field taking into account the elastic interaction of the film with the substrate. Such results are very different from those considered for attached thick films in literature.

Keywords

magnetic propertiesferromagneticfilm
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 888: Symposium V – Materials and Devices for Smart Systems II , 2005 , 0888-V04-12
Copyright
Copyright © Materials Research Society 2006

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References

REFERENCES

1. Fidler, J. and Schrefl, T., J. Phys. D: Appl. Phys. 33, R135 (2000).Google Scholar
2. Cullen, J. R., Hathaway, K. B. and Clark, A. E., J. Appl. Phys. 81, 5417 (1997).Google Scholar
3. Zhu, B., Lo, C. C. H., Lee, S. J., and Jiles, D. C., J. Appl. Phys. 89, 7009 (2001).Google Scholar
4. Shu, Y. C., Lin, M. P. and Wu, K. C., Mechanics of Materials, 36, 975 (2004).Google Scholar
5. Shu, Y. C. and Yen, J. H., Mater. Res. Soc. Symp. Proc., 785, D13.4.1 (2004).Google Scholar
6. Zhang, J. X. and Chen, L. Q., Acta Mater. 53, 2845 (2005).Google Scholar
7. Landau, L. D. and Lifshitz, E., Physikalische Zeitschrift der Sowjetunion 8, 153 (1935).Google Scholar
8. Shu, Y. C., J. Elasticity, 66, 63 (2002).Google Scholar
9. James, R. D. and Kinderlehrer, D., Philos. Mag. B, 68, 237 (1993).Google Scholar
10. Shu, Y. C., Yen, J. H. and Wu, K. C., (2005) (in preparation).Google Scholar
11. Li, Y. L., Hu, S. Y., Liu, Z. K., and Chen, L. Q., Appl. Phys. Lett, 78, 3878 (2001).Google Scholar
12. Gao, Y. F. and Suo, Z., J. Appl. Mech., 69, 419 (2002).Google Scholar