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Microcrystalline Si thin films by re-crystallization of electrophoretic deposited Si nanoparticle films

Published online by Cambridge University Press:  30 September 2014

Braden Bills ,
Mukul Dubey ,
Baojie Yan ,
David Stevenson  and
Qi Hua Fan
Braden Bills
Affiliation:
Applied NanoFilms, 2301 Research Park Way STE 217, Brookings, SD 57006, USA Electrical Engineering department, South Dakota State University, Brookings, SD 57006, USA
Mukul Dubey
Affiliation:
Electrical Engineering department, South Dakota State University, Brookings, SD 57006, USA
Baojie Yan
Affiliation:
Wintek Electro-Optical Corp., 1665 Highland Dr. STE E, Ann Arbor, MI 48108, USA
David Stevenson
Affiliation:
Wintek Electro-Optical Corp., 1665 Highland Dr. STE E, Ann Arbor, MI 48108, USA
Qi Hua Fan
Affiliation:
Applied NanoFilms, 2301 Research Park Way STE 217, Brookings, SD 57006, USA Electrical Engineering department, South Dakota State University, Brookings, SD 57006, USA
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Abstract

A new route to producing microcrystalline silicon (µc-Si) thin films by re-crystallizing Si nanoparticle films by flash lamp method is presented. High quality Si nanoparticle films with high uniformity and high particle packing density were obtained using a stable non-aqueous Si nanoparticle suspension and the electrophoretic deposition (EPD) method. Morphology and crystallinity of as-deposited and flash lamp re-crystallized Si nanoparticle films were studied.

Keywords

Sinanostructurethin film
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1694: Symposium EE – Advances in Inorganic Semiconductor Nanoparticles and Their Applications , 2014 , mrss14-1694-ee07-03
Copyright
Copyright © Materials Research Society 2014 

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References

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