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Published online by Cambridge University Press: 01 February 2011
This work investigates the mechanical properties of ITO on PEN substrates as a function of processing conditions, including rf power, substrate temperature, and substrate treatment. The best mechanical performance is obtained from high substrate temperature and low rf power. Plasma treatment gases also influence mechanical properties, with mixture of nitrogen and hydrogen gases producing the best results. This work provides an initial understanding of the impact of sputter process conditions on film's mechanical performance.