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Mechanical Characteristics of Al-Si-Cu Structural Films by Uniaxial Tensile Test with Elongation Measurement Image Analysis

Published online by Cambridge University Press:  01 February 2011

Hiroki Fujii ,
Takahiro Namazu ,
Yasushi Tomizawa  and
Shozo Inoue
Hiroki Fujii
Affiliation:
[email protected][email protected], University of Hyogo, Himeji, Japan
Takahiro Namazu
Affiliation:
[email protected], University of Hyogo, Himeji, Hyogo, Japan
Yasushi Tomizawa
Affiliation:
[email protected], Toshiba Corporation, Kawasaki, Kanagawa, Japan
Shozo Inoue
Affiliation:
[email protected], University of Hyogo, Himeji, Hyogo, Japan
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Abstract

This paper presents mechanical characteristics of sputtered Al-Si-Cu film used as a structural material in microelectromechanical systems (MEMS). Novel tensile test technique with an elongation measurement image analysis system has been developed. Uniaxial tensile tests were conducted at temperatures ranging from room temperature (R.T.) to 358 K. No specimen-size effect on Young's modulus, yield stress, and fracture strength, was found, whereas the annealing and temperature effects were clearly observed. To study mechanical degradation mechanism, cyclic loading tests were conducted under constant stress- and strain-amplitude modes. In constant stress-amplitude mode, stain amplitude increased with an increase of loading cycles due to creep-like deformation. Almost of the specimens fractured during the tests. Meanwhile, in constant strain-amplitude mode, stress amplitude gradually decreased with increasing cycles due to stress-relaxation, but no fatigue failure was observed.

Keywords

microelectro-mechanical (MEMS)Alstrength
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1129: Symposium V – Materials and Devices for Smart Systems III , 2008 , 1129-V14-06
Copyright
Copyright © Materials Research Society 2009

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References

REFERENCES

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