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Magnetic and Structural Characteristics of Multi-layered Films Composed of Fe and Si Ultra-thin Layers

Published online by Cambridge University Press:  26 February 2011

K. Kubota
Affiliation:
Dept. of Physical Electronics, Tokyo Institute of Technology 2–12–1 O-okayama, Meguro-ku, Tokyo 152, Japan
M. Nagakubo
Affiliation:
Osaka Vacuum Ltd., 775, 7-cho Ohtori-Higashi-machi, Sakai 593, Japan
M. Naoe
Affiliation:
Dept. of Physical Electronics, Tokyo Institute of Technology 2–12–1 O-okayama, Meguro-ku, Tokyo 152, Japan
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Abstract

Fe and Si layers were deposited alternately by using ion beam sputtering apparatus and the relationship between crystal structure and soft magnetic properties of these multi-layered films have been investigated in detail. The clear periodicity of multi-layered films was confirmed even at the thicknesses of Fe and Si layers δFe and δSi as small as 8.5 Å.

The saturation magnetization 4πMs for all Fe layers decreased with decrease of δFe and δSi, and the coercivity Hc of these films took minimum of 1.0 Oe at δFe of 8.5 Å.

Such a significant decrease of 4TEMs may be attributed to the formation of nonmagnetic regions at both side of each Fe layers. The thickness of these nonmagnetic regions may be estimated at approximately 1.5 Å from the measured value of 4flMs. This thickness seems to be very small because it is almost equal to that of one monolayer of bcc α-Fe. The low Hc of the films with δFe and δSi of 8.5 Å may be due to the formation of ultra-fine crystallites in Fe layer by insertion of amorphous Si layer and the direct magnetostatic interaction among Fe layers.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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References

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