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Macro-and Microstrain Relaxation in Annealed Ag Films During Ageing at Room Temperature

Published online by Cambridge University Press:  10 February 2011

R. C. Currie ,
R. Delhez  and
E. J. Mitiemeijer
R. C. Currie
Affiliation:
Laboratory of Materials Science, Delft University of Technology, Rotterdamseweg 137, 2628 AL, Delft, The Netherlands, [email protected]
R. Delhez
Affiliation:
Laboratory of Materials Science, Delft University of Technology, Rotterdamseweg 137, 2628 AL, Delft, The Netherlands, [email protected]
E. J. Mitiemeijer
Affiliation:
Laboratory of Materials Science, Delft University of Technology, Rotterdamseweg 137, 2628 AL, Delft, The Netherlands, [email protected] also at Max Planck Institute for Metals Research, Seestraße 92, 70174, Stuttgart, Germany
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Abstract

The relaxation of thermally induced strain in 500 nm thick polycrystalline Ag layers electron-beam deposited onto Si wafers was traced during ageing at room temperature. The layers consisted predominantly of matrix crystallites with {111} planes parallel to the surface and twin crystallites with {51 l} planes parallel to the surface. The macrostrain in the plane of the layer was determined from the X-ray diffraction line-profile position and the microstrain from the diffraction-line broadening. The residual macrostress relaxed from 160 MPa to 30 MPa in the matrix crystallites and from 170 MPa to 50 MPa in the twin crystallites. Simultaneously with the decrease in macrostress the microstrain decreases significantly for both texture fractions. The strain relaxation behaviour is governed by movement and subsequent annihilation of defects in the layer.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 505 , 1997 , 167
Copyright
Copyright © Materials Research Society 1998

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References

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