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Luminescence Measurement of Fused Silica in the Presence of Excimer Laser Radiation

Published online by Cambridge University Press:  21 February 2011

Nobu Kuzuu ,
Yohshikazu Komatsu  and
Masataka Murahara
Nobu Kuzuu
Affiliation:
Nippon Silica Glass Yamaguchi Co., 4555 Tonda, Shin-Nanyo, Yamaguchi 746, JAPAN
Yohshikazu Komatsu
Affiliation:
Graduate student of Faculty of Eng. Tokai Univ.
Masataka Murahara
Affiliation:
Faculty of Eng., Tokai Univ., 1117 Kitakaname, Hiratsuka, kanagawa 259-12, JAPAN
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Abstract

Exicimer laser induced luminsecence characteristics of type III fused silica was investigated. The luminescence characteristics in the ultraviolet wavelength region are strongly depending on the intensity of red luminescence at 650 nm. A sample without red luminescence shows a strong emission band at 280 nm. We found that the 280 nm band is corresponds to a absorption band at 225 nm. To clearfy the nature of the 280 nm band, we studied the difference of luminescence of samples which had been kept on heating under various atmosphares, i.e., N2, O2, He, H2, and air. By these results we suspect that the 280 nm band is related to hydrogen atom which are weakly bounded to the glass network.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 172: Symposium P – Optical Fiber Materials and Processing , 1989 , 119
Copyright
Copyright © Materials Research Society 1990

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