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Low-Dielectric Constant Film Formation By Plasma Fluorination Of Hydrocarbon Polymers

Published online by Cambridge University Press:  15 February 2011

Hiroshi Kudo ,
Rika Shinohara  and
Masao Yamada
Hiroshi Kudo
Affiliation:
Fujitsu LTD, Thin Film Technology Dept., Process Dev. Div. 1015Kamikodanaka, Nakahara-ku, Kawasaki 211, Japan
Rika Shinohara
Affiliation:
Fujitsu LTD, Thin Film Technology Dept., Process Dev. Div. 1015Kamikodanaka, Nakahara-ku, Kawasaki 211, Japan
Masao Yamada
Affiliation:
Fujitsu LTD, Thin Film Technology Dept., Process Dev. Div. 1015Kamikodanaka, Nakahara-ku, Kawasaki 211, Japan
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Abstract

We have investigated plasma fluorination of hydrocarbon polymer films spincoated onto silicon wafers. Fluorinated hydrocarbon polymers gave low dielectric constants of 2.0 – 2.4 which was close to that of PTFE. However, the thermal stability of these fluorinated polymers inferior to that of the non-fluorinated polymers. We believe that this is due to a decrease in the molecular weight resulting from C-C bond cleavage. We think that such a side reaction will be controlled by removing residual oxygen in a fluorination chamber. The molecular structures of the fluorinated polymers were analyzed by X-ray photo emission spectroscopy. Finally, we proposed direct patterning of interlayer dielectrics using plasma fluorination.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 381: Symposium F – Low-Dielectric Constant Materials--Synthesis and Applications in Micro. , 1995 , 105
Copyright
Copyright © Materials Research Society 1995

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References

[1] Kakumu, M. and Igawa, S.: Nikkei Micro devices. (1989) No.8,81 [in Japanese].Google Scholar
[2] Denton, D. D., Day, D. R., Priore, D. F., Senturia, S. D., Anolick, E. S. and Scheider, D.: J. of Elec. Mat. 14(1985) 119.Google Scholar
[3] Larsen, R. A.: IMB J. Res. Develop. 24(1980)268.Google Scholar
[4] Moss, S. J., Jolly, A. M. and Tighe, B. J.: Plasma Chemistry and Plasma Processing. 6 (1986) No.4,401.Google Scholar
[5] Nakajima, K., Bell, A.T. and Shen, M.: J. Appl. Polym. Sci. 23 (1979)2627.Google Scholar
[6] Clark, D. T. and Ivin, K. J.: Structural studies of macromolecules by spectroscopic method (Wiley, New York, 1976).Google Scholar