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Low Coherence Interferometric Metrology for Ultra-thin MEMs Structures

Published online by Cambridge University Press:  15 March 2011

Wojciech Walecki ,
Frank Wei ,
Phuc Van ,
Kevin Lai ,
Tim Lee ,
Vitali Souchkov ,
SH Lau  and
Ann Koo
Wojciech Walecki
Affiliation:
Frontier Semiconductor, 1631 North 1st Street San Jose CA 95112, USA
Frank Wei
Affiliation:
Frontier Semiconductor, 1631 North 1st Street San Jose CA 95112, USA
Phuc Van
Affiliation:
Frontier Semiconductor, 1631 North 1st Street San Jose CA 95112, USA
Kevin Lai
Affiliation:
Frontier Semiconductor, 1631 North 1st Street San Jose CA 95112, USA
Tim Lee
Affiliation:
Frontier Semiconductor, 1631 North 1st Street San Jose CA 95112, USA
Vitali Souchkov
Affiliation:
Frontier Semiconductor, 1631 North 1st Street San Jose CA 95112, USA
SH Lau
Affiliation:
Frontier Semiconductor, 1631 North 1st Street San Jose CA 95112, USA
Ann Koo
Affiliation:
Frontier Semiconductor, 1631 North 1st Street San Jose CA 95112, USA
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Abstract

We present application of low coherence interferometry to characterization of ultra-thin MEMs structures such as membranes in micro-machined devices.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 820: Symposia O/R – Nanoengineered Assemblies and Advanced Micro/Nanosystems , 2004 , O8.8
Copyright
Copyright © Materials Research Society 2004

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References

1. Huang, D., Swanson, E. A., Lin, C. P., Schuman, J. S., Stinson, W. G., Chang, W., Hee, M. R., Flotte, T., Gregory, K., Puliafito, C. A., Fujimoto, J. G., “Optical coherence tomography,” Science 254, 1178–1181 (1991).Google Scholar
2. Walecki, W.J., Lu, R., Lee, J., Watman, M., Lau, S.H., Koo, A., “Novel non-contact wafer mapping and stress metrologies for thin and ultrathin chip manufacturing applications” 3 rd International Workshop on Thin Semiconductor Devices – Manufacturing and Applications November 25, 2002, Munich, Germany Google Scholar
3. Walecki, W. J., Wei, Frank, Van, Phuc, Lai, Kevin, Lee, Tim, Lau, SH, and Koo, Ann, “Novel Low Coherence Metrology for Nondestructive Characterization of High Aspect Ratio Micro-fabricated and Micro-machined Structures”, accepted for Photonics West: Micromachining and Microfabrication, 24 Jan 2004 - 29 Jan 2004 San Jose, California, USA Google Scholar