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Liquid Compounds for CVD of Alkaline Earth Metals

Published online by Cambridge University Press:  10 February 2011

Roy G. Gordon ,
Seán T. Barry ,
Xinye Liu  and
Daniel J. Teff
Roy G. Gordon
Affiliation:
Harvard University Chemical Laboratories, 12 Oxford Street, Cambridge, MA 02138
Seán T. Barry
Affiliation:
Harvard University Chemical Laboratories, 12 Oxford Street, Cambridge, MA 02138
Xinye Liu
Affiliation:
Harvard University Chemical Laboratories, 12 Oxford Street, Cambridge, MA 02138
Daniel J. Teff
Affiliation:
Harvard University Chemical Laboratories, 12 Oxford Street, Cambridge, MA 02138
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Abstract

The first room-temperature liquid compounds useful for the CVD of alkaline earth metalcontaining oxides were prepared by reacting metal (Mg, Ca, Sr, and Ba) beta-diketonates with novel polyamine ligands. The compounds are monomeric and can be completely flash-vaporized without leaving any non-volatile residue detectable at the parts-per-million level. A stable, solvent-free liquid mixture was formed by mixing new liquid barium, strontium and titanium compounds. CVD experiments using direct liquid injection of this liquid mixture deposited films of barium strontium titanate. This approach should also be applicable to the deposition of many other multicomponent oxides containing alkaline earth metals: ferroelectrics (strontium bismuth tantalate), metallic conductors (strontium vanadium oxide, lanthanum strontium cobalt oxide), phosphors (calcium tungstate), non-linear optical materials (beta-barium borate), magnetic oxides (barium ferrite), colossal magnetoresistive materials (lanthanum strontium manganese oxide), high Tc superconductors (yttrium barium copper oxide, bismuth calcium strontium copper oxide) and microwave dielectrics (barium magnesium tantalate).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 574: Symposia BB – Multicomponent Oxide Films for Electronics , 1999 , 23
Copyright
Copyright © Materials Research Society 1999

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References

1. For reviews, see Hubert-Pfalzgraf, L. G., Electrochemical Soc. Proc. 97–25, 824 (1998); W. A. Wojtczak, P. F. Fleig and M. J. Hampden-Smith, Advances in Organometallic Chem. 40, 215 (1996); A. A. Drozdov and S. I. Troyanov, Main Group Met. Chem. XIX, 547 (1996); R. E. Sievers, S. B. Turnipseed, L. Huang and A. F. Lagolate, Coord. Chem. Rev. 128 285 (1993).Google Scholar
2. Rees, W. S., Jr., Caballero, C. R. and Hesse, W., Angew. Chem. Int. Ed. Engl. 31, 735 (1992).10.1002/anie.199207351Google Scholar
3. Nash, J. A, Barnes, J. C., Cole-Hamilton, David J., Richards, B. C., Cook, S. L. and Hitchman, M. L., Advanced Materials for Optics and Electronics 5, 1 (1995); I. K. Igumenov, P. P. Semyannikov and S. V. Belaya, Polyhedron 15,4521 (1996).10.1002/amo.860050103Google Scholar
4. Gordon, R. G., Chen, F., DiCeglie, N. J., Jr., Kenigsberg, A., Liu, X., Teff, D. J. and Thornton, J., Mat. Res. Soc. Symp. Proc. 495, 63 (1998).10.1557/PROC-495-63Google Scholar
5. Gordon, R. G., Barry, S. T., Broomhall-Dillard, R. N. R., DiCeglie, N. J., Jr., Liu, X. and Teff, D. J., J. Electrochem. Soc. (to be published).Google Scholar
6. Berg, E. and Herrera, N.M., Anal. Chim. Acta 60, 117, (1972); S. R. Drake, M. B. Hursthouse, K. M. A. Malik and D. J. Otway, J. Chem. Soc., Dalton Trans. 1993, 2883.10.1016/S0003-2670(01)81890-0Google Scholar