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Lateral/vertical Homoepitaxial Growth on 4H-SiC Surfaces Controlled by Dislocations

Published online by Cambridge University Press:  01 February 2011

Yoosuf N. Picard ,
Andrew J. Trunek ,
Philip G. Neudeck  and
Mark E. Twigg
Yoosuf N. Picard
Affiliation:
[email protected], Naval Research Lab, Electronics Science and Technology, Code 6812, 4555 Overlook Ave. SW, Washington, DC, 20375, United States
Andrew J. Trunek
Affiliation:
[email protected], Ohio Aerospace Institute, 21000 Brookpark Rd., Cleveland, OH, 44135, United States
Philip G. Neudeck
Affiliation:
[email protected], NASA Glenn Research Center, 21000 Brookpark Rd., Cleveland, OH, 44135, United States
Mark E. Twigg
Affiliation:
[email protected], Naval Research Lab, Electronics Science and Technology, Code 6812, 4555 Overlook Ave. SW, Washington, DC, 20375, United States
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Abstract

This paper reports the influence of screw dislocations on the lateral/vertical growth behavior of chemical vapor deposited (CVD) on-axis homoepitaxial 4H-SiC films grown on patterned mesas. Electron channeling contrast imaging (ECCI) was utilized to image both atomic steps and dislocations while the film structure/orientation was determined using electron backscatter diffraction (EBSD). The presence and position of screw dislocations within the mesa impacted the resultant film thickness, lateral shape, and atomic step morphology. Mesa side walls that incline inwards due to faceting during screw-dislocation driven vertical film growth can intersect with the dislocation step sources near the side walls. If this occurs for all screw dislocations on a mesa, we observe a transition towards laterally dominated growth that produces webbed structures and films surfaces exhibiting significantly lower step densities. Transition from vertical to lateral dominated growth is consistent with ECCI imaged dislocation very near a mesa side wall.

Keywords

chemical vapor deposition (CVD) (deposition)dislocationsscanning electron microscopy (SEM)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1069: Symposium D – Silicon Carbide 2008—Materials, Processing and Devices , 2008 , 1069-D05-02
Copyright
Copyright © Materials Research Society 2008

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References

REFERENCES

1. Powell, J.A., Neudeck, P.G., Trunek, A.J., Beheim, G.M., Matus, L.G., Hoffman, R.W. Jr., Keys, L.J., Appl. Phys. Lett. 77, 1449 (2000).Google Scholar
2. Picard, Y.N., Twigg, M.E., Caldwell, J.D., Eddy, C.R. Jr., Neudeck, P.G., Trunek, A.J., and Powell, J.A., J. Elec. Mater., in press (2008).Google Scholar
3. Picard, Y.N., Twigg, M.E., Caldwell, J.D., Eddy, C.R. Jr., Neudeck, P.G., Trunek, A.J., and Powell, J.A., Appl. Phys. Lett. 90, 234101 (2007).Google Scholar
4. Neudeck, P.G., Powell, J.A., Beheim, G.M., Benavage, E.L., Abel, P.B., Trunek, A.J., Spry, D.J., Dudley, M., and Vetter, W.M., J. Appl. Phys. 92, 2391 (2002).Google Scholar
5. Neudeck, P.G., Du, H., Skowronski, M., Spry, D.J., and Trunek, A.J., J. Phys. D.40, 6139 (2007).Google Scholar