Hostname: page-component-586b7cd67f-r5fsc Total loading time: 0 Render date: 2024-11-25T17:27:26.412Z Has data issue: false hasContentIssue false

Laser Patterning of High Temperature Superconducting Oxide Films

Published online by Cambridge University Press:  25 February 2011

A. Gupta
Affiliation:
IBM Thomas J. Watson Research Center, Yorktown Heights, NY 10598
B. W. Hussey
Affiliation:
IBM Thomas J. Watson Research Center, Yorktown Heights, NY 10598
R. Jagannathan
Affiliation:
IBM Thomas J. Watson Research Center, Yorktown Heights, NY 10598
E. I. Cooper
Affiliation:
IBM Thomas J. Watson Research Center, Yorktown Heights, NY 10598
E. A. Giess
Affiliation:
IBM Thomas J. Watson Research Center, Yorktown Heights, NY 10598
Get access

Abstract

A focused argon ion laser (514 nm) beam has been used for patterning superconducting lines of YBa2Cu3O7–δ using films prepared from metal trifluoroacetate solution precursors. A stoichiometric mixture of the precursors is dissolved in methanol, and the solution is spun on yttria-stabilized zirconia substrate to form a film. The film is patterned by irradiating in selected areas by direct laser writing to convert the irradiated layers to an intermediate fluoride state, the nonirradiated areas being unchanged. The nonirradiated areas are then dissolved away, leaving a pattern of the fluoride material. This patterned layer is converted to the superconducting oxide in a subsequent high temperature step involving reaction with water vapor.

Type
Research Article
Copyright
Copyright © Materials Research Society 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Thin Film Processinz and Characterization of High Temperature Superconductors, edited by Harper, J.M.E., Colton, R.J., and Feldman, L.C. (American Physical Society Proceedings No. 165, New York, NY 1988) pp. 2211.Google Scholar
2. Gurvich, M. and Fiory, A.T., Appl. Phys. Lett. 51, 1027 (1987).CrossRefGoogle Scholar
3. Rice, C.E., Dover, R.B. van, and Fisanick, G.J., ibid., 51,1842 (1987).Google Scholar
4. Hamdi, A.H., Mantese, J.V., Nicheli, A.L., Laugal, R.C.O., Dungan, D.F., Zhang, Z.H., and Padmanabhan, K.R., ibid., 51, 2152 (1987).Google Scholar
5. Gross, M.E., Hong, M., Liou, S.H., Gallagher, P.K., and Kwo, J., ibid., 52, 160 (1988).Google Scholar
6. Gupta, A., Jagannathan, R., Cooper, E.I., Giess, E.A., Landman, J.I., and Hussey, B.W., ibid., 52, 2077 (1988).Google Scholar
7. Gross, N.E., Appelbaum, A., and Gallagher, P.K., J. Appl. Phys. 6, 1628 (1987).CrossRefGoogle Scholar
8. Gupta, A. and Jagannathan, R. in Laser and Particle-Beam Chemical Processing, edited by Ehrlich, D.J., Higashi, G.S., and Oprysko, M.M. (Mater. Res. Soc. Proc. 101, Pittsburgh, PA 1988) pp. 95100.Google Scholar
9. Gupta, A., Hussey, B.W., Koren, G., Cooper, E. I., and Jagannathan, R. in Processing and Applications of High T Superconductors, edited by Mayo, W.E. (The Metallurgical Society, Warrendale, PA 1988) pp. 7382.Google Scholar
10. Gupta, A. and Koren, G., Appl. Phys. Lett. 52, 665 (1988).Google Scholar
11. Mantese, J.V., Catalan, A.B., Mance, A.M., Hamdi, A.H., Micheli, A.L., Sell, J.A., and Meyer, M.S., Appl. Phys. Lett. 53, 1335 (1988).CrossRefGoogle Scholar
12. Piglmayer, K., Doppelbauer, J., and Bauerle, D. in Laser-Controlled Chemical Processing of Surfaces, edited by Johnson, A. Wayne, Ehrlich, D.J., and Schlossberg, H.R. (Mater. Res. Soc. Proc. 29, Pittsburgh, PA 1984) pp. 4754.Google Scholar